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Inventor

Frank Sinclair

Inventor
Quincy, MA, US

Overview

108→
Patents
1988–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 108 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps40%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
C30BSingle-crystal growth6%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%
C23CCoating metallic material4%
G11BInformation storage based on relative movement between record carrier and transducer4%
H01LSemiconductor devices4%
Y10TTechnical subjects covered by former us classification4%
H05HPlasma technique3%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution3%
PatentTitleYear
11,127,557Ion source with single-slot tubular cathode202111,120,966System and method for improved beam current from an ion source202111,114,277Dual cathode ion source202111,094,504Resonator coil having an asymmetrical profile202111,056,319Apparatus and system having extraction assembly for wide angle ion beam202111,049,691Ion beam quality control using a movable mass resolving device202111,011,343High-current ion implanter and method for controlling ion beam using high-current ion implanter202110,937,624Apparatus and method for controlling ion beam using electrostatic filter202110,886,098Electrostatic filter and ion implanter having asymmetric electrostatic configuration202110,867,773Apparatus and techniques for generating bunched ion beam202010,866,503Low emission implantation mask and substrate assembly202010,811,214Low emission cladding and ion implanter202010,804,068Electostatic filter and method for controlling ion beam properties using electrostatic filter202010,790,116Electostatic filter and method for controlling ion beam using electostatic filter202010,763,071Compact high energy ion implantation system202010,763,072Apparatus, system and techniques for mass analyzed ion beam202010,748,738Ion source with tubular cathode202010,741,361Dual cathode ion source202010,714,301Conductive beam optics for reducing particles in ion implanter202010,692,697Apparatus and techniques for decelerated ion beam with no energy contamination202010,665,415Apparatus and method for controlling ion beam properties using electrostatic filter202010,651,011Apparatus and techniques for generating bunched ion beam202010,504,682Conductive beam optic containing internal heating element201910,468,224Apparatus and method for controlling ion beam properties using energy filter201910,446,372Dual cathode ion source201910,395,969Transparent halo for reduced particle generation201910,192,727Electrodynamic mass analysis201910,147,584Apparatus and techniques for decelerated ion beam with no energy contamination201810,074,514Apparatus and method for improved ion beam current20189,978,556Parallelizing electrostatic acceleration/deceleration optical element20189,978,554Dual cathode ion source20189,957,636System and method for crystalline sheet growth using a cold block and gas jet20189,934,928Source housing assembly for controlling ion beam extraction stability and ion beam current20189,905,396'Curved post scan electrode'20189,850,569Ion implantation for superconductor tape fabrication20179,805,931'Liquid immersion doping'20179,793,087'Techniques and apparatus for manipulating an ion beam'20179,704,528'Apparatus and method for improved perpendicular recording medium using ion implantation in a magnetic field'20179,574,285'Apparatus and method for monitoring and controlling thickness of a crystalline layer'20179,567,691'Melt purification and delivery system'20179,281,165'Bias electrodes for tandem accelerator'20169,269,542'Plasma cathode charged particle lithography system'20169,112,064'Floating sheet production apparatus and method'20159,093,104'Technique for manufacturing bit patterned media'20159,057,146'Eddy current thickness measurement apparatus'20159,029,811'Apparatus to control an ion beam'20159,018,829'Excited gas injection for ion implant control'20159,012,337'Platen control'20159,006,692'Apparatus and techniques for controlling ion implantation uniformity'20158,993,980'Dual stage scanner for ion beam control'20158,952,344'Techniques for processing photoresist features using ions'20158,933,335'Current lead with a configuration to reduce heat load transfer in an alternating electrical current environment'20158,884,244'Dual mode ion implanter'20148,853,653'Apparatus and techniques for controlling ion implantation uniformity'20148,841,631'Apparatus and techniques for controlling ion angular spread'20148,835,879'Reduction of deposition by separation of ion beam and neutral flow'20148,830,616'Magnetic storage device'20148,746,666'Media carrier'20148,709,533'Technique for manufacturing bit patterned media'20148,698,108'Ion beam measurement system and method'20148,679,356'Mask system and method of patterning magnetic media'20148,659,229'Plasma attenuation for uniformity control'20148,604,443'System and method for manipulating an ion beam'20138,590,485'Small form factor plasma source for high density wide ribbon ion beam generation'20138,545,624'Method for continuous formation of a purified sheet from a melt'20138,519,353'Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam'20138,501,624'Excited gas injection for ion implant control'20138,475,591'Method of controlling a thickness of a sheet formed from a melt'20138,466,431'Techniques for improving extracted ion beam quality using high-transparency electrodes'20138,460,748'Patterned magnetic bit data storage media and a method for manufacturing the same'20138,436,318'Apparatus for controlling the temperature of an RF ion source window'20138,357,912'Techniques for providing a multimode ion source'20138,330,125'Ion beam tuning'20128,309,935'End terminations for electrodes used in ion implantation systems'20128,263,944'Directional gas injection for an ion source cathode assembly'20128,263,941'Mass analysis magnet for a ribbon beam'20128,258,489'Transmission energy contamination detector'20128,226,903'Removal of a sheet from a production apparatus'20128,188,448'Temperature controlled ion source'20128,183,542'Temperature controlled ion source'20128,153,466'Mask applied to a workpiece'20128,129,695'System and method for controlling deflection of a charged particle beam within a graded electrostatic lens'20128,064,071'Floating sheet measurement apparatus and method'20118,049,168'Time-of-flight segmented Faraday'20118,003,498'Particle beam assisted modification of thin film materials'20117,998,224'Removal of a sheet from a production apparatus'20117,888,653'Techniques for independently controlling deflection, deceleration and focus of an ion beam'20117,855,087'Floating sheet production apparatus and method'20107,821,213'Techniques for controlling a charged particle beam'20107,816,153'Method and apparatus for producing a dislocation-free crystalline sheet'20107,723,697'Techniques for optical ion beam metrology'20107,700,925'Techniques for providing a multimode ion source'20107,692,139'Techniques for commensurate cusp-field for effective ion beam neutralization'20107,622,724'High voltage insulator for preventing instability in an ion implanter due to triple-junction breakdown'20097,579,602'Ion implantation with a collimator magnet and a neutral filter magnet'20096,429,139'Serial wafer handling mechanism'20026,414,329'Method and system for microwave excitation of plasma in an ion beam guide'20026,347,919'Wafer processing chamber having separable upper and lower halves'20026,213,184'Seam welder'20015,865,942'Seam welder'19995,814,819'System and method for neutralizing an ion beam using water vapor'19985,760,409'Dose control for use in an ion implanter'19985,670,217'Method for capturing and removing contaminant particles from an interior region of an ion implanter'19975,656,092'Apparatus for capturing and removing contaminant particles from an interior region of an ion implanter'19975,608,223'Ion implantation device'19975,525,807'Ion implantation device'19965,156,741'Wastewater treatment system and method'1992D0294362'Hot air discharge tip for membrane seam welder'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–1999Based in Placerville, CA, US· patent location history
1992–2017Patents assigned to SINCLAIR FRANK (32)· patent assignee history
1992Based in Aloha, OR, US· patent location history
1996–2017Based in Quincy, MA, US· patent location history
2001Based in Diamond Springs, CA, US· patent location history
2009–2016Patents assigned to VARIAN SEMICONDUCTOR EQUIPMENT (53)· patent assignee history
2012–2013Patents assigned to BENVENISTE VICTOR (8)· patent assignee history
2014–2021Based in Boston, MA, US· patent location history
2017–2021Patents assigned to VARIAN SEMICONDUCTOR EQUIPMENT ASS INC (26)· patent assignee history
2020–2021Patents assigned to APPLIED MATERIALS INC (14)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
VARIAN SEMICONDUCTOR EQUIPMENT532009–2016
SINCLAIR FRANKself321992–2017
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC262017–2021
APPLIED MATERIALS INC142020–2021
BENVENISTE VICTOR82012–2013
Locations
LocationPatentsSpan
Quincy, Massachusetts, US571996–2017
Boston, Massachusetts, US472014–2021
Placerville, California, US21988–1999
Diamond Springs, California, US12001
Aloha, OR, US11992