Inventor
Shiyu Zhang
Inventor
Beijing, CN
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus18%
H04WWireless communication networks18%
G01NInvestigating or analysing materials by determining their chemical or physical properties15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
B23KSoldering or unsoldering5%
G01BMeasuring length, thickness or similar linear dimensions5%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein5%
A61BDiagnosis3%
B22DCasting of metals3%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering3%
PatentTitleYear
10,848,998Wireless-communication electronic device and method202010,849,033Wireless communication device and wireless communication method202010,823,943Plasma source with lamp house correction202010,820,337Device in wireless communication system, and wireless communication method202010,761,362Display panel and display device202010,667,225Method and device for vehicle-to-vehicle communication202010,656,098Wafer defect inspection and review systems202010,642,112Array substrate, display panel and display device202010,582,429Wireless communication device and wireless communication method202010,462,824Wireless communication system, and base station side and user equipment side device and method201910,420,111Wireless communication device and wireless communication method201910,309,907All reflective wafer defect inspection and review systems and methods20199,423,357'Oblique illuminator for inspecting manufactured substrates'20168,794,801'Oblique illuminator for inspecting manufactured substrates'2014RE044116'Substrate-alignment using detector of substrate material'20137,947,968'Processing substrates using direct and recycled radiation'20117,751,067'Substrate-alignment using detector of substrate material'20107,253,376'Methods and apparatus for truncating an image formed with coherent radiation'20077,177,099'Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus'20076,863,403'Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus'20056,776,219'Castable refractory investment mold materials and methods of their use in infiltration casting'20046,422,701'Visual field tester'20025,940,224'Wide band infrared camera lens systems'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999Based in Redwood City, CA, US· patent location history
2002–2016Based in Hayward, CA, US· patent location history
2004Based in Cambridge, MA, US· patent location history
2005–2013Patents assigned to ULTRATECH INC (6)· patent assignee history
2013–2014Patents assigned to ZHANG SHIYU (2)· patent assignee history
2014–2020Patents assigned to KLA TENCOR CORP (5)· patent assignee history
2019–2020Patents assigned to SONY CORP (7)· patent assignee history
2019–2020Based in Beijing, CN· patent location history
2019–2020Based in Fremont, CA, US· patent location history
2020Patents assigned to BOE TECHNOLOGY GROUP CO LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SONY CORP | 7 | 2019–2020 |
| ULTRATECH INC | 6 | 2005–2013 |
| KLA TENCOR CORP | 5 | 2014–2020 |
| BOE TECHNOLOGY GROUP CO LTD | 2 | 2020 |
| ZHANG SHIYUself | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Beijing, CN | 9 | 2019–2020 |
| Hayward, California, US | 9 | 2002–2016 |
| Fremont, California, US | 3 | 2019–2020 |
| Cambridge, Massachusetts, US | 1 | 2004 |
| Redwood City, California, US | 1 | 1999 |