Inventor
SANDER CATHARINA REINIER DERKS
Inventor
NL
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
H05GX-ray technique20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01LSemiconductor devices10%
H05BElectric heating10%
PatentTitleYear
11,982,947Contamination trap202411,650,511Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method202311,556,067Contamination trap202311,300,890Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2022–2024Based in NL· patent location history
2024Patents assigned to ASML NETHERLAND BV (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 4 | 2022–2024 |
| ASML NETHERLAND BV | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 4 | 2022–2024 |