Inventor
Tomio Nagatsuka
Inventor
Mie, JP
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests50%
PatentTitleYear
6,255,034'Radiation sensitive composition'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001Patents assigned to JSR CORP (1)· patent assignee history
2001Based in Mie, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 1 | 2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mie, JP | 1 | 2001 |