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Inventor

Kazuo Ushida

Inventor
Tokyo, JP

Overview

24→
Patents
1983–2007
Patent span
Physics
Primary field (CPC G)

Patents· 24 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices51%
G02BOptical elements, systems or apparatus23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
F21VFunctional features or details of lighting devices or systems thereof5%
F21WIndexing scheme associated with subclasses f21k, f21l, f21s and f21v, relating to uses or applications of lighting devices or systems5%
F21YIndexing scheme associated with subclasses f21k, f21l, f21s and f21v, relating to the form or the kind of the light sources or of the colour of the light emitted5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
PatentTitleYear
RE039662'Projection exposure apparatus'20076,958,803'Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics'20056,750,952'Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing'2004RE038403'Projection optical system and projection exposure apparatus'2004RE038320'Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system'20036,610,460'Exposure method'20036,449,031'Method for use of a critical dimensional test structure'20026,262,793'Method of manufacturing and using correction member to correct aberration in projection exposure apparatus'20016,094,256'Method for forming a critical dimension test structure and its use'20006,049,374'Illumination apparatus, a projection exposure apparatus having the same, a method of manufacturing a device using the same, and a method of manufacturing the projection exposure apparatus'20005,943,172'Projection optical system and projection exposure apparatus'19995,883,704'Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system'19995,831,776'Projection optical system and projection exposure apparatus'19985,805,344'Projection optical system and projection exposure apparatus'19985,754,340'Projection optical system and projection exposure apparatus using the same'19985,636,000'Projection optical system and projection exposure apparatus using the same'19975,576,801'Projection exposure apparatus'19965,530,518'Projection exposure apparatus'19965,311,362'Projection exposure apparatus'19944,965,630'Projection exposure apparatus'19904,931,830'Projection exposure apparatus'19904,734,746'Exposure method and system for photolithography'19884,592,624'Objective lens for microscope of low magnification'19864,403,835'Objective lens for microscope'1983

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1983–2007Patents assigned to NIPPON KOGAKU KK (6)· patent assignee history
1983–2007Based in Tokyo, JP· patent location history
1990–2005Patents assigned to NIKON CORP (17)· patent assignee history
1997–2005Based in Setagaya, JP· patent location history
2000Patents assigned to NIKON PRECISION INC (1)· patent assignee history
2002–2004Patents assigned to NIKON PREC INC (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP171990–2005
NIPPON KOGAKU KK61983–2007
NIKON PREC INC22002–2004
NIKON PRECISION INC12000
Locations
LocationPatentsSpan
Tokyo, JP221983–2007
Setagaya, JP21997–2005