Inventor
SEONGSUE KIM
Inventor
KR
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light20%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
PatentTitleYear
12,099,293Phase shift mask for extreme ultraviolet lithography and a method of manufacturing a semiconductor device using the same202411,852,583Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the method202311,774,846Phase shift masks for extreme ultraviolet lithography202311,635,371Apparatus and method for measuring phase of extreme ultraviolet (EUV) mask and method of fabricating EUV mask including the method202311,487,197Phase shift masks for extreme ultraviolet lithography202211,372,323Phase-shift mask for extreme ultraviolet lithography2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to SAMSUNG ELECTRONICS CO LTD (6)· patent assignee history
2022–2024Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 6 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 6 | 2022–2024 |