Inventor
Tetsuo Mizuniwa
Inventor
Yokosuka, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C02Fprimary
C02FTreatment of water, waste water, sewage, or sludge19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
C11DDetergent compositions11%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
H05KPrinted circuits8%
B01DSeparation5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B01FMixing, e.g. dissolving, emulsifying or dispersing3%
B01LChemical or physical laboratory apparatus for general use3%
PatentTitleYear
8,846,773'Method for manufacturing anion exchange resin, anion exchange resin, method for manufacturing cation exchange resin, cation exchange resin, mixed bed resin, and method for manufacturing ultrapure water for washing electronic component material'20148,765,825'Method for manufacturing anion exchange resin, anion exchange resin, method for manufacturing cation exchange resin, cation exchange resin, mixed bed resin, and method for manufacturing ultrapure water for washing electronic component material'20148,476,324'Method for manufacturing anion exchange resin, anion exchange resin, method for manufacturing cation exchange resin, cation exchange resin, mixed bed resin, and method for manufacturing ultrapure water for washing electronic component material'20138,012,755'Water quality evaluation method and substrate contacting apparatus used'20116,464,867'Apparatus for producing water containing dissolved ozone'20026,450,181'Cleaning solution for electronic materials and method for using same'20026,409,918'Apparatus for supplying ozonated ultrapure water'20026,372,699'Cleaning solution for electronic materials and method for using same'20026,346,505'Cleaning solution for electromaterials and method for using same'20025,814,157'Method for cleaning a semiconductor wafer with an improved cleaning solution'19985,647,989'Method for recovering abrasive particles'19975,106,503'Ultra-pure water supply piping system'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992Based in Kawasaki, JP· patent location history
1997–2014Patents assigned to KURITA WATER IND LTD (10)· patent assignee history
1997–2002Based in Yokosuka, JP· patent location history
1998–2014Based in Tokyo, JP· patent location history
2013–2014Patents assigned to FUKUI TAKEO (3)· patent assignee history
2013–2014Patents assigned to MIZUNIWA TETSUO (3)· patent assignee history
2013–2014Patents assigned to TOKUNAGA KAZUHIKO (3)· patent assignee history
2013–2014Patents assigned to YASUTOMI MASAKO (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KURITA WATER IND LTD | 10 | 1997–2014 |
| FUKUI TAKEO | 3 | 2013–2014 |
| MIZUNIWA TETSUOself | 3 | 2013–2014 |
| TOKUNAGA KAZUHIKO | 3 | 2013–2014 |
| YASUTOMI MASAKO | 3 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokosuka, JP | 6 | 1997–2002 |
| Tokyo, JP | 5 | 1998–2014 |
| Kawasaki, JP | 1 | 1992 |