Inventor

Mutsuya Takahashi

Inventor
Ebina, JP

Overview

12→
Patents
2001–2017
Patent span
Performing operations
Primary field (CPC B)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B81Cprimary
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems10%
H01LSemiconductor devices10%
H10HInorganic light-emitting semiconductor devices having potential barriers10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
Y10TTechnical subjects covered by former us classification10%
B01FMixing, e.g. dissolving, emulsifying or dispersing5%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%
B01LChemical or physical laboratory apparatus for general use5%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering5%
B81BMicrostructural devices or systems, e.g. micromechanical devices5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2017Patents assigned to FUJI XEROX CO LTD (12)· patent assignee history
2001–2003Based in Nakai-machi, JP· patent location history
2005–2017Based in Ebina, JP· patent location history
2013Patents assigned to HIROTA MASAKI (1)· patent assignee history
2013Patents assigned to TAKAHASHI MUTSUYA (1)· patent assignee history
2013Patents assigned to YAMADA TAKAYUKI (1)· patent assignee history
2013–2017Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJI XEROX CO LTD122001–2017
HIROTA MASAKI12013
TAKAHASHI MUTSUYAself12013
YAMADA TAKAYUKI12013
Locations
LocationPatentsSpan
Ebina, JP82005–2017
Kanagawa, JP22013–2017
Nakai-machi, JP22001–2003