Inventor
Riki Ogawa
Inventor
Kawasaki, JP
Overview
Patents· 61 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties35%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
G06TImage data processing or generation, in general15%
G02BOptical elements, systems or apparatus8%
H01JElectric discharge tubes or discharge lamps8%
G01BMeasuring length, thickness or similar linear dimensions5%
H04NPictorial communication, e.g. television3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G06KGraphical data reading2%
PatentTitleYear
11,101,103Multiple electron beam inspection apparatus and multiple electron beam inspection method202111,004,657Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus, and multiple electron beam irradiation method202111,004,193Inspection method and inspection apparatus202110,984,978Multiple electron beam inspection apparatus and multiple electron beam inspection method202110,984,525Pattern inspection method and pattern inspection apparatus202110,846,846Pattern inspection apparatus and pattern inspection method202010,775,326Electron beam inspection apparatus and electron beam inspection method202010,768,126Multiple charged particle beam inspection apparatus and multiple charged particle beam inspection method202010,734,190Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus and multiple electron beam irradiation method202010,727,026Charged particle beam inspection method202010,719,928Pattern inspection apparatus and pattern inspection method202010,712,295Electron beam inspection apparatus and electron beam inspection method202010,655,956Displacement measuring apparatus, electron beam inspection apparatus, and displacement measuring method202010,643,327Inspection method and inspection apparatus202010,636,138Polarized image acquisition apparatus, pattern inspection apparatus, polarized image acquisition method, and pattern inspection method202010,488,180Mask inspection apparatus and mask inspection method201910,444,487Polarized image acquisition apparatus, pattern inspection apparatus, polarized image acquisition method, and pattern inspection method201910,410,335Inspection method and inspection apparatus201910,401,299Image capturing apparatus and inspection apparatus and inspection method201910,386,308Pattern inspection apparatus for detecting a pattern defect201910,359,370Template substrate for use in adjusting focus offset for defect detection201910,282,635Pattern inspection apparatus201910,222,341Focusing apparatus, focusing method, and pattern inspection method201910,197,507Inspection apparatus201910,192,304Method for measuring pattern width deviation, and pattern inspection apparatus201910,041,892Charged particle beam inspection apparatus and charged particle beam inspection method201810,036,714Image capturing device and inspection apparatus and inspection method201810,007,980Inspection method and inspection apparatus20189,846,928Inspection method and inspection apparatus20179,804,103'Inspection method, template substrate, and focus offset method'20179,683,947'Defect inspection device'20179,575,010'Inspection apparatus and inspection method'20179,557,277'Inspection apparatus and inspection method'20179,423,356'Illumination apparatus and inspection apparatus'20169,410,899'Illumination apparatus and pattern inspection apparatus'20169,213,001'Focal position adjustment method and inspection method'20159,207,189'Sample support apparatus'20159,194,817'Defect detection method'20159,157,870'Pattern test apparatus'20159,086,388'Pattern evaluation method and apparatus'20159,036,143'Inspection apparatus and inspection method'20158,797,525'Pattern inspection apparatus and pattern inspection method'20148,767,200'Luminous flux branching element and mask defect inspection apparatus'20148,755,040'Illuminating apparatus, pattern inspection apparatus, and method of forming illuminating light'20148,199,403'Light polarization control using serial combination of surface-segmented half wavelength plates'20128,072,592'Reticle defect inspection apparatus and reticle defect inspection method'20118,049,897'Reticle defect inspection apparatus and inspection method using thereof'20118,004,655'Automatic focus adjusting mechanism and optical image acquisition apparatus'20117,911,599'Reticle defect inspection apparatus and reticle defect inspection method'20117,894,051'Reticle defect inspection apparatus and reticle defect inspection method'20117,760,349'Mask-defect inspecting apparatus with movable focusing lens'20107,551,273'Mask defect inspection apparatus'20097,508,526'Defect inspecting apparatus'20097,495,779'Level detection apparatus'20097,491,959'Defect inspection apparatus'20097,388,660'Light amount measurement device and light amount measurement method'20087,379,176'Mask defect inspection apparatus'20087,359,043'Pattern inspecting method and pattern inspecting apparatus'20087,345,755'Defect inspecting apparatus and defect inspection method'20087,123,345'Automatic focusing apparatus'20066,909,501'Pattern inspection apparatus and pattern inspection method'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2016Patents assigned to TOSHIBA KK (14)· patent assignee history
2005–2020Based in Yokohama, JP· patent location history
2006–2021Based in Kawasaki, JP· patent location history
2008–2010Patents assigned to TOPCON CORP (4)· patent assignee history
2008–2019Based in Kanagawa, JP· patent location history
2011–2012Patents assigned to NEC CORP (6)· patent assignee history
2011–2014Patents assigned to OGAWA RIKI (4)· patent assignee history
2014–2021Patents assigned to NUFLARE TECHNOLOGY INC (44)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NUFLARE TECHNOLOGY INC | 44 | 2014–2021 |
| TOSHIBA KK | 14 | 2005–2016 |
| NEC CORP | 6 | 2011–2012 |
| OGAWA RIKIself | 4 | 2011–2014 |
| TOPCON CORP | 4 | 2008–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 30 | 2006–2021 |
| Kanagawa, JP | 28 | 2008–2019 |
| Yokohama, JP | 3 | 2005–2020 |