Inventor

Johannes Christiaan Maria Jasper

Inventor
Veldhoven, NL

Overview

19→
Patents
2000–2018
Patent span
Physics
Primary field (CPC G)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices73%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2001Patents assigned to ASM LITHOGRAPHY BV (2)· patent assignee history
2000–2018Based in Veldhoven, NL· patent location history
2004–2018Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2012–2016Patents assigned to JASPER JOHANNES CHRISTIAAN MARIA (4)· patent assignee history
2012–2016Patents assigned to BASELMANS JOHANNES JACOBUS MATHEUS (3)· patent assignee history
2014Patents assigned to BARAGONA MARCO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV172004–2018
JASPER JOHANNES CHRISTIAAN MARIAself42012–2016
BASELMANS JOHANNES JACOBUS MATHEUS32012–2016
ASM LITHOGRAPHY BV22000–2001
BARAGONA MARCO12014
Locations
LocationPatentsSpan
Veldhoven, NL192000–2018