Inventor

Bernd Doerband

Inventor
Aalen, DE

Overview

22→
Patents
2006–2019
Patent span
Physics
Primary field (CPC G)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions34%
G01MTesting static or dynamic balance of machines or structures24%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
Y10TTechnical subjects covered by former us classification10%
G02BOptical elements, systems or apparatus8%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
B24BMachines, devices, or processes for grinding or polishing2%
B29DProducing particular articles from plastics or from substances in a plastic state2%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
PatentTitleYear
10,359,703Method for aligning a mirror of a microlithographic projection exposure apparatus201910,101,667Method for aligning a mirror of a microlithographic projection exposure apparatus20189,310,693'Method for operating a projection exposure tool and control apparatus'20169,250,062'Devices for determining layer thickness and/or contamination level of a belt'20168,687,203'Method and apparatus for determining a shape of an optical test surface'20148,593,642'Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device'20138,508,749'Method of measuring a deviation of an optical surface from a target shape using interferometric measurement results'20138,269,981'Method and an apparatus for measuring a deviation of an optical test surface from a target shape'20128,264,695'Method of measuring a deviation of an optical surface from a target shape'20128,243,281'Method and system for measuring a surface of an object'20128,159,678'Method of measuring a deviation of an optical surface from a target shape'20128,089,634'Optical element and method of calibrating a measuring apparatus comprising a wave shaping structure'20127,936,521'Method of measuring a deviation of an optical surface from a target shape'20117,791,737'Method and apparatus for interferometrically measuring the shape of a test object'20107,738,117'Method of manufacturing an optical element'20107,605,926'Optical system, method of manufacturing an optical system and method of manufacturing an optical element'20097,581,305'Method of manufacturing an optical component'20097,522,292'System and method for determining a shape of a surface of an object and method of manufacturing an object having a surface of a predetermined shape'20097,436,520'Method of calibrating an interferometer optics and of processing an optical element having an optical surface'20087,274,467'Phase shifting interferometric method, interferometer apparatus and method of manufacturing an optical element'20077,167,251'Method of processing an optical substrate'20077,133,225'Method of manufacturing an optical system'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2010Patents assigned to ZEISS CARL SMT AG (9)· patent assignee history
2006–2019Based in Aalen, DE· patent location history
2011–2019Patents assigned to ZEISS CARL SMT GMBH (12)· patent assignee history
2012–2014Patents assigned to DOERBAND BERND (7)· patent assignee history
2012–2013Patents assigned to SCHULTE STEFAN (4)· patent assignee history
2012–2013Patents assigned to ARNOLD RALF (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL SMT GMBH122011–2019
ZEISS CARL SMT AG92006–2010
DOERBAND BERNDself72012–2014
SCHULTE STEFAN42012–2013
ARNOLD RALF22012–2013
Locations
LocationPatentsSpan
Aalen, DE222006–2019