Inventor
PRAKET P. JHA
Inventor
US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
C23CCoating metallic material20%
H01JElectric discharge tubes or discharge lamps5%
H10BElectronic memory devices5%
H10DInorganic electric semiconductor devices5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
11,804,372CD dependent gap fill and conformal films202311,508,611Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films202211,365,476Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices202211,367,614Surface roughness for flowable CVD film202211,170,994CD dependent gap fill and conformal films202111,152,248Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2023Patents assigned to APPLIED MATERIALS INC (6)· patent assignee history
2021–2023Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 6 | 2021–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 6 | 2021–2023 |