Inventor
Yuichiro Goto
Inventor
Haibara-gun, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
H01LSemiconductor devices10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
C09DCoating compositions, e.g. paints, varnishes or lacquers9%
B29CShaping or joining of plastics8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts4%
Y10TTechnical subjects covered by former us classification4%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
B41JTypewriters3%
PatentTitleYear
10,957,723Vehicle, display device and manufacturing method for a semiconductor device202110,504,739Curable composition for optical imprinting and pattern forming method201910,373,863Method of manufacturing porous body, porous body, method of manufacturing device, device, method of manufacturing wiring structure, and wiring structure201910,261,413Photocurable composition for imprints, pattern forming method, and method for manufacturing device201910,246,605Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device201910,189,928Curable composition, pattern forming method, pattern, and method for manufacturing device201910,191,375Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit and process for producing device201910,175,576Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device20199,862,847'Inkjet discharge method, pattern formation method, and pattern'20189,482,950'Curable composition for imprints, pattern-forming method and pattern'20169,435,308'Fuel injection valve, internal combustion engine and fuel injection method'20167,344,415'Fuse block'20087,177,591'Frequency converter and radio communications system employing the same'20076,724,804'Frequency converter and radio communications system employing the same'20045,505,898'Plastic pipe and manufacturing method thereof'19965,462,314'Electro-fusion fitting having a solid embedded heater with perpendicular projections'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995Patents assigned to GAS RES INST (1)· patent assignee history
2004–2007Patents assigned to KOBE STEEL LTD (2)· patent assignee history
2004–2007Based in Kobe, JP· patent location history
2008Based in Kakegawa, JP· patent location history
2016–2019Patents assigned to FUJIFILM CORP (9)· patent assignee history
2016Patents assigned to BOSCH CORP (1)· patent assignee history
2016Patents assigned to GOTO YUICHIRO (1)· patent assignee history
2016–2019Based in Haibara-gun, JP· patent location history
2016Based in Yokohama, JP· patent location history
2021Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 9 | 2016–2019 |
| KOBE STEEL LTD | 2 | 2004–2007 |
| BOSCH CORP | 1 | 2016 |
| GAS RES INST | 1 | 1995 |
| GOTO YUICHIROself | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Haibara-gun, JP | 9 | 2016–2019 |
| Kobe, JP | 2 | 2004–2007 |
| Kanagawa, JP | 1 | 2021 |
| Yokohama, JP | 1 | 2016 |
| Kakegawa, JP | 1 | 2008 |