LexDanaLexDanabeta
Inventor

Wen-Yao Chen

Inventor
Hsinchu, TW

Overview

4→
Patents
2001–2011
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
PatentTitleYear
8,082,119'Method and system for mask fabrication process control'20117,260,442'Method and system for mask fabrication process control'20076,318,946'Interlock system for semiconductor wafer transport apparatus'20016,263,253'Method for allocating bottleneck resources'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2011Patents assigned to TAIWAN SEMICONDUCTOR MFG (4)· patent assignee history
2001–2011Based in Hsinchu, TW· patent location history
2011Patents assigned to CHANG CHEN-YU (1)· patent assignee history
2011Patents assigned to CHEN WEN-YAO (1)· patent assignee history
2011Patents assigned to HWANG YUH-FONG (1)· patent assignee history
2011Patents assigned to KUO CHIECH-YI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG42001–2011
CHANG CHEN-YU12011
CHEN WEN-YAOself12011
HWANG YUH-FONG12011
KUO CHIECH-YI12011
Locations
LocationPatentsSpan
Hsinchu, TW42001–2011