Inventor
Satoru Asai
Inventor
Kawasaki, JP
Overview
Patents· 34 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
F01DNon-positive displacement machines or engines, e.g. steam turbines9%
F05DIndexing scheme for aspects relating to non-positive-displacement machines or engines, gas-turbines or jet-propulsion plants6%
B23KSoldering or unsoldering4%
B24CAbrasive or related blasting with particulate material4%
B60HArrangements of heating, cooling, ventilating or other air-treating devices specially adapted for passenger or goods spaces of vehicles4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
G06TImage data processing or generation, in general4%
H10DInorganic electric semiconductor devices4%
C22CAlloys2%
PatentTitleYear
10,189,105Shielding gas for mag welding, mag welding method, and welded structure20199,841,279'Apparatus and method for quantitative evaluation of braze bonding length with use of radiation'20179,309,773'Steam turbine and steam turbine blade'20169,217,731'Welding inspection method and apparatus thereof'20158,553,198'Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure'20138,409,786'Pattern forming method and method for manufacturing semiconductor device'20138,227,153'Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure'20128,105,023'Steam turbine'20127,971,160'Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask'20117,732,107'Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure'20107,604,912'Local flare correction'20097,601,471'Apparatus and method for correcting pattern dimension and photo mask and test photo mask'20097,577,556'Method and equipment for simulation'20097,455,570'Large part polishing apparatus and polishing method'20087,371,489'Photomask, method for detecting pattern defect of the same, and method for making pattern using the same'20087,144,303'Method of polishing a large part and abrasive for use in the method'20067,074,524'Photomask, method for detecting pattern defect of the same, and method for making pattern using the same'20066,499,946'Steam turbine rotor and manufacturing method thereof'20026,420,094'Optical exposure method'20026,412,713'Fuel injection apparatus'20026,232,758'Load drive control apparatus'20016,107,708'Brushless motor'20006,045,976'Optical exposure method'20005,994,004'Levenson type phase shift photomask and manufacture method of semiconductor device using such photomask'19995,979,779'Air conditioning system for vehicle'19995,876,877'Patterned mask having a transparent etching stopper layer'19995,818,078'Semiconductor device having a regrowth crystal region'19985,607,821'Optical exposure method'19975,561,010'Phase shift optical mask and method of correcting defects in optical mask'19965,465,220'Optical exposure method'19955,428,478'Optical mask and exposure method using the optical mask'19955,424,153'Optical mask using phase shift and method of producing the same'19955,418,093'Projection exposure method and an optical mask for use in projection exposure'19955,368,963'Photomask and method of fabricating the same'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2008Patents assigned to FUJITSU LTD (14)· patent assignee history
1994–2013Based in Kawasaki, JP· patent location history
1999–2002Patents assigned to DENSO CORP (3)· patent assignee history
1999–2001Based in Ichinomiya, JP· patent location history
2002–2017Patents assigned to TOSHIBA KK (7)· patent assignee history
2002–2008Based in Yokohama, JP· patent location history
2010–2013Patents assigned to FUJITSU SEMICONDUCTOR LTD (5)· patent assignee history
2012–2019Patents assigned to ASAI SATORU (7)· patent assignee history
2012–2015Based in Kanagawa, JP· patent location history
2016–2019Based in Chigasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJITSU LTD | 14 | 1994–2008 |
| ASAI SATORUself | 7 | 2012–2019 |
| TOSHIBA KK | 7 | 2002–2017 |
| FUJITSU SEMICONDUCTOR LTD | 5 | 2010–2013 |
| DENSO CORP | 3 | 1999–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 22 | 1994–2013 |
| Chigasaki, JP | 3 | 2016–2019 |
| Yokohama, JP | 3 | 2002–2008 |
| Ichinomiya, JP | 3 | 1999–2001 |
| Kanagawa, JP | 2 | 2012–2015 |