Inventor
Wonyong Koh
Inventor
Daejeon, KR
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material30%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
H01BCables8%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
H01LSemiconductor devices5%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals3%
C01GCompounds containing metals not covered by subclasses c01d or c01f3%
C30BSingle-crystal growth3%
PatentTitleYear
10,763,001Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition202010,131,680Group 4 metal element-containing alkoxy compound, preparing method thereof, precursor composition including the same for film deposition, and method of depositing film using the same201810,014,089Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition201810,005,795Group 4 metal element-containing compound, method of preparing the same, precursor composition including the same for depositing film, and method of depositing film using the same20189,957,614Ruthenium compound, preparation method therefor, precursor composition for film deposition containing same, and method for depositing film by using same20189,431,144'Indium-containing oxide film and preparing method thereof'20169,255,324'Aluminum precursor composition'20168,215,264'Atomic layer deposition apparatus'20127,976,898'Atomic layer deposition apparatus'20117,476,618'Selective formation of metal layers in an integrated circuit'20095,955,146'Process for the preparation of magnesium oxide films using organomagnesium compounds'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2020Based in Daejeon, KR· patent location history
2009Patents assigned to ASM JAPAN (1)· patent assignee history
2009Based in Hachioji, JP· patent location history
2011–2012Patents assigned to ASM GENITECH KOREA LTD (2)· patent assignee history
2012Patents assigned to HONG KYUNG IL (1)· patent assignee history
2012Patents assigned to JEONG SANG JIN (1)· patent assignee history
2012Based in Daejoen, KR· patent location history
2016–2020Patents assigned to UP CHEMICAL CO LTD (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UP CHEMICAL CO LTD | 7 | 2016–2020 |
| ASM GENITECH KOREA LTD | 2 | 2011–2012 |
| ASM JAPAN | 1 | 2009 |
| HONG KYUNG IL | 1 | 2012 |
| JEONG SANG JIN | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Daejeon, KR | 9 | 1999–2020 |
| Daejoen, KR | 1 | 2012 |
| Hachioji, JP | 1 | 2009 |