Inventor
Chia-Ping Chiang
Inventor
Taipei, TW
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G06Fprimary
G06FElectric digital data processing29%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
H01LSemiconductor devices9%
H10DInorganic electric semiconductor devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
Y02PClimate change mitigation technologies in the production or processing of goods5%
B82YSpecific uses or applications of nanostructures3%
H01JElectric discharge tubes or discharge lamps3%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation2%
PatentTitleYear
10,853,552Method for improving circuit layout for manufacturability202010,796,055Method for coloring circuit layout and system for performing the same202010,509,881Method for coloring circuit layout and system for performing the same201910,324,369Methods for generating a mandrel mask201910,282,504Method for improving circuit layout for manufacturability20199,911,606'Mandrel spacer patterning in multi-pitch integrated circuit manufacturing'20189,418,191'Providing electron beam proximity effect correction by simulating write operations of polygonal shapes'20169,390,223'Method of determining whether a layout is colorable'20169,390,217'Methodology of optical proximity correction optimization'20169,189,588'Polygon-based optical proximity correction'20159,176,373'System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patterns'20159,165,095'Target point generation for optical proximity correction'20158,959,460'Layout decomposition method'20158,631,360'Methodology of optical proximity correction optimization'20148,527,916'Dissection splitting with optical proximity correction to reduce corner rounding'20138,464,186'Providing electron beam proximity effect correction by simulating write operations of polygonal shapes'20138,381,153'Dissection splitting with optical proximity correction and mask rule check enforcement'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (10)· patent assignee history
2013–2014Patents assigned to CHIANG CHIA-PING (4)· patent assignee history
2013–2014Patents assigned to HUANG WEN-CHUN (4)· patent assignee history
2013–2014Patents assigned to LIU RU-GUN (4)· patent assignee history
2013–2020Based in Taipei, TW· patent location history
2016–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 10 | 2013–2016 |
| TAIWAN SEMICONDUCTOR MFG CO LTD | 7 | 2016–2020 |
| CHIANG CHIA-PINGself | 4 | 2013–2014 |
| HUANG WEN-CHUN | 4 | 2013–2014 |
| LIU RU-GUN | 4 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Taipei, TW | 17 | 2013–2020 |