Inventor
Takehiko Komatsu
Inventor
Chiba, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1040%
H01JElectric discharge tubes or discharge lamps10%
PatentTitleYear
6,897,154'Selective etching of low-k dielectrics'20056,613,689'Magnetically enhanced plasma oxide etch using hexafluorobutadiene'20036,451,703'Magnetically enhanced plasma etch process using a heavy fluorocarbon etching gas'20026,403,491'Etch method using a dielectric etch chamber with expanded process window'20026,362,109'Oxide/nitride etching having high selectivity to photoresist'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2005Patents assigned to APPLIED MATERIALS INC (5)· patent assignee history
2002–2003Based in Chiba, JP· patent location history
2002Based in Santa Clara, CA, US· patent location history
2002Based in Ichikawa, JP· patent location history
2005Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 5 | 2002–2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiba, JP | 2 | 2002–2003 |
| Yokohama, JP | 1 | 2005 |
| Santa Clara, California, US | 1 | 2002 |
| Ichikawa, JP | 1 | 2002 |