Inventor
Leonard Wai Fung Kho
Inventor
San Francisco, CA, US
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices63%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
C23CCoating metallic material2%
H01JElectric discharge tubes or discharge lamps2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
10,760,158Ex situ coating of chamber components for semiconductor processing202010,203,610Apparatus and method for providing fluid for immersion lithography20199,817,319'Apparatus and method for providing fluid for immersion lithography'20179,547,243'Apparatus and method for providing fluid for immersion lithography'20179,329,492'Apparatus and method to control vacuum at porous material using multiple porous materials'20169,285,683'Apparatus and method for providing fluid for immersion lithography'20169,217,933'Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine'20159,176,394'Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate'20158,934,080'Apparatus and methods for recovering fluid in immersion lithography'20158,896,807'Apparatus and method for providing fluid for immersion lithography'20148,780,323'Apparatus and method for recovering liquid droplets in immersion lithography'20148,743,343'Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine'20148,634,055'Apparatus and method to control vacuum at porous material using multiple porous materials'20148,610,873'Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate'20138,520,187'Apparatus and method for providing fluid for immersion lithography'20138,477,284'Apparatus and method to control vacuum at porous material using multiple porous materials'20138,400,610'Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine'20138,289,497'Apparatus and methods for recovering fluid in immersion lithography'20128,237,911'Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine'20128,068,209'Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool'20118,054,448'Apparatus and method for providing fluid for immersion lithography'20117,929,109'Apparatus and method for recovering liquid droplets in immersion lithography'20117,751,026'Apparatus and method for recovering fluid for immersion lithography'20107,576,833'Gas curtain type immersion lithography tool using porous material for fluid removal'20097,532,309'Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid'20097,375,800'Non-contact pneumatic transfer for stages with small motion'20087,292,313'Apparatus and method for providing fluid for immersion lithography'20077,283,200'System and method for measuring displacement of a stage'20076,917,412'Modular stage with reaction force cancellation'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2019Patents assigned to NIKON CORP (28)· patent assignee history
2005–2020Based in San Francisco, CA, US· patent location history
2011–2016Patents assigned to KHO LEONARD WAI FUNG (9)· patent assignee history
2011–2016Patents assigned to POON ALEX KA TIM (9)· patent assignee history
2011–2015Patents assigned to COON DEREK (8)· patent assignee history
2012–2015Patents assigned to KESWANI GAURAV (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 28 | 2005–2019 |
| KHO LEONARD WAI FUNGself | 9 | 2011–2016 |
| POON ALEX KA TIM | 9 | 2011–2016 |
| COON DEREK | 8 | 2011–2015 |
| KESWANI GAURAV | 7 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Francisco, California, US | 29 | 2005–2020 |