Inventor
Koji Higashi
Inventor
Takatsuki, JP
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus21%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein19%
Y10TTechnical subjects covered by former us classification11%
B29CShaping or joining of plastics8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
C08JWorking-up5%
C09KMaterials for miscellaneous applications, not provided for elsewhere4%
H05KPrinted circuits4%
B29BPreparation or pretreatment of the material to be shaped3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
PatentTitleYear
9,505,932'Synthetic wood meal'20168,871,345'Method for producing composite pellet for extrusion molding, and composite pellet for extrusion molding produced by the method'20147,820,252'Transflective film, transflective polarizer, and polarizing light source device and liquid crystal display device using the same'20106,807,005'Polarizer, polarizing light source device and liquid crystal display'20046,783,125'Stapler processing apparatus for paper collating machine'20046,762,266'Phase retarder'20046,225,570'Circuit board having electric component and its manufacturing method'20016,208,396'Normally white mode twisted nematic liquid crystal display device having improved viewing angle characteristics'20016,097,460'Phase retarder film containing TiO.sub.2'20006,083,340'Process for manufacturing a multi-layer circuit board'20006,060,183'Phase retarder and liquid crystal display device using the same'20005,926,313'Phase retarder film'19995,920,454'Capacitor-mounted circuit board'19995,888,634'Phase retarder film'19995,693,253'Optically anisotropic material, process for producing it, and retardation plate and liquid crystal device using same'19975,688,436'Optically anisotropic material, process for producing it, and retardation plate and liquid crystal display device using same'19975,658,505'Process for making a phase retarder film'19975,631,755'Layered inorganic compound-containing phase retarder'19975,474,731'Process for producing phase retarder film'19955,430,566'Liquid crystal device with phase retarder having layered inorganic compound'19955,366,682'Process for producing phase retarder'19945,354,512'Dye-containing polarizing film'19945,310,509'Dye-containing light-polarizing film'19945,285,303'Phase retarder and process for producing the same'19945,082,601'Light-polarizing films'19925,061,042'Phase retarder and liquid crystal display using the same'19914,802,745'Light-polarizing films'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2010Patents assigned to SUMITOMO CHEMICAL CO (21)· patent assignee history
1989–1999Based in Osaka, JP· patent location history
1994–1999Based in Takatsuki, JP· patent location history
1999Patents assigned to HOKURIKO ELECTRIC INDUSTRY CO (1)· patent assignee history
1999–2001Based in Toyama, JP· patent location history
2000–2004Based in Ibaraki, JP· patent location history
2004–2010Based in Niihama, JP· patent location history
2014–2016Patents assigned to WPC CORP (2)· patent assignee history
2014Patents assigned to HIGASHI KOJI (1)· patent assignee history
2016Patents assigned to BEIJING SHENGSHENG CULTURE LTD LIABILITY COMPANY (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO CHEMICAL CO | 21 | 1989–2010 |
| WPC CORP | 2 | 2014–2016 |
| BEIJING SHENGSHENG CULTURE LTD LIABILITY COMPANY | 1 | 2016 |
| HIGASHI KOJIself | 1 | 2014 |
| HOKURIKO ELECTRIC INDUSTRY CO | 1 | 1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Takatsuki, JP | 9 | 1994–1999 |
| Osaka, JP | 6 | 1989–1999 |
| Ibaraki, JP | 4 | 2000–2004 |
| Niihama, JP | 3 | 2004–2010 |
| Toyama, JP | 3 | 1999–2001 |