Inventor
Yuzo Tasaki
Inventor
Hachioji, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material19%
C04BLime, magnesia15%
H10NElectric solid-state devices not otherwise provided for15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H10BElectronic memory devices12%
H10DInorganic electric semiconductor devices12%
C01GCompounds containing metals not covered by subclasses c01d or c01f4%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium4%
C30BSingle-crystal growth4%
PatentTitleYear
7,960,901'Piezoelectric device having a ferroelectric film including a ferroelectric material'20117,956,519'Piezoelectric device having a ferroelectric film including a solid solution'20117,825,569'Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element'20107,323,257'Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element'20087,205,056'Ceramic film and method of manufacturing the same, ferroelectric capacitor, semiconductor device, and other element'20077,138,013'Ceramic film and method of manufacturing the same, semiconductor device, and piezoelectric device'20067,008,669'Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element'20066,602,344'Ceramic film and method of manufacturing the same, semiconductor device, and piezoelectric device'20036,149,975'Potassium-containing thin film and process for producing the same'20006,037,485'CVD precursors and film preparation method using the same'20005,952,047'CVD precursors and film preparation method using the same'19995,904,771'Method of subliming material in CVD film preparation method'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2000Patents assigned to DOWA MINING CO (4)· patent assignee history
1999Patents assigned to PIONEER ELECTRIC CORP (1)· patent assignee history
1999–2011Based in Hachioji, JP· patent location history
1999–2000Based in Tokyo, JP· patent location history
2000Patents assigned to PIONEER ELECTRONIC CORP (1)· patent assignee history
2000Based in Haichioji, JP· patent location history
2003–2011Patents assigned to SEIKO EPSON CORP (8)· patent assignee history
2007Based in Higashimatsuyama, JP· patent location history
2010Based in Hachoiji, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO EPSON CORP | 8 | 2003–2011 |
| DOWA MINING CO | 4 | 1999–2000 |
| PIONEER ELECTRIC CORP | 1 | 1999 |
| PIONEER ELECTRONIC CORP | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hachioji, JP | 7 | 1999–2011 |
| Tokyo, JP | 2 | 1999–2000 |
| Hachoiji, JP | 1 | 2010 |
| Higashimatsuyama, JP | 1 | 2007 |
| Haichioji, JP | 1 | 2000 |