Inventor
Paul F. Petric
Inventor
Brewster, NY, US
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps56%
B82YSpecific uses or applications of nanostructures27%
G21KHandling of particles or ionising radiation not otherwise provided for7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
F16JPistons2%
G01BMeasuring length, thickness or similar linear dimensions2%
G01RMeasuring electric variables2%
PatentTitleYear
9,715,995'Apparatus and methods for electron beam lithography using array cathode'20179,355,818'Reflection electron beam projection lithography using an ExB separator'20168,957,394'Compact high-voltage electron gun'20158,642,981'Electron microscope assembly for viewing the wafer plane image of an electron beam lithography tool'20148,373,144'Quasi-annular reflective electron patterning device'20138,253,119'Well-based dynamic pattern generator'20127,714,287'Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope'20106,828,571'Apparatus and methods of controlling surface charge and focus'20046,262,425'Curvilinear axis set-up for charged particle lithography'20016,069,684'Electron beam projection lithography system (EBPS)'20005,793,048'Curvilinear variable axis lens correction with shifted dipoles'19985,747,814'Method for centering a lens in a charged-particle system'19985,650,628'Simultaneous deflections in charged-particle beams'19975,635,719'Variable curvilinear axis deflection means for particle optical lenses'19975,585,629'Electron beam nano-metrology system'19965,530,251'Inductively coupled dual-stage magnetic deflection yoke'19965,530,252'Inductively coupled dual-stage magnetic deflection yoke'19965,481,164'Variable axis stigmator'19965,389,858'Variable axis stigmator'19955,136,167'Electron beam lens and deflection system for plural-level telecentric deflection'19924,607,167'Charged particle beam lithography machine incorporating localized vacuum envelope'19864,584,479'Envelope apparatus for localized vacuum processing'19864,560,880'Apparatus for positioning a workpiece in a localized vacuum processing system'19854,528,451'Gap control system for localized vacuum processing'19854,524,261'Localized vacuum processing apparatus'19854,469,950'Charged particle beam exposure system utilizing variable line scan'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984–1986Patents assigned to VARIAN ASSOCIATES (6)· patent assignee history
1984–1986Based in Swampscott, MA, US· patent location history
1992–2001Patents assigned to IBM (12)· patent assignee history
1992–2000Based in Brewster, NY, US· patent location history
2001–2017Based in Pleasanton, CA, US· patent location history
2010–2017Patents assigned to KLA TENCOR CORP (7)· patent assignee history
2012–2013Patents assigned to MCCORD MARK A (2)· patent assignee history
2013–2016Patents assigned to PETRIC PAUL F (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 12 | 1992–2001 |
| KLA TENCOR CORP | 7 | 2010–2017 |
| VARIAN ASSOCIATES | 6 | 1984–1986 |
| MCCORD MARK A | 2 | 2012–2013 |
| PETRIC PAUL Fself | 2 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Brewster, New York, US | 11 | 1992–2000 |
| Pleasanton, California, US | 9 | 2001–2017 |
| Swampscott, Massachusetts, US | 6 | 1984–1986 |