Inventor

Kuniaki Noami

Inventor

Maizuru, JP

Overview

1999

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary

B01DSeparation25%

B24BMachines, devices, or processes for grinding or polishing25%

B28DWorking stone or stone-like materials25%

C02FTreatment of water, waste water, sewage, or sludge25%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1999Patents assigned to HITACHI ZOSEN METAL WORKS CO L (1)· patent assignee history

1999Patents assigned to MIMASU SEMICONDUCTOR IND CO (1)· patent assignee history

1999Patents assigned to OHTOMO CHEMICAL IND CORP (1)· patent assignee history

1999Patents assigned to SHINETSU HANDOTAI KK (1)· patent assignee history

1999Based in Maizuru, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI ZOSEN METAL WORKS CO L	1	1999
MIMASU SEMICONDUCTOR IND CO	1	1999
OHTOMO CHEMICAL IND CORP	1	1999
SHINETSU HANDOTAI KK	1	1999

Locations

Location	Patents	Span
Maizuru, JP	1	1999