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Inventor

SHUNMA TANAKA

Inventor
JP

Overview

1→
Patents
2023
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B05Dprimary
B05DProcesses for applying fluent materials to surfaces, in general20%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
C08LCompositions of macromolecular compounds20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
11,780,948Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to TOKYO OHKA KOGYO CO LTD (1)· patent assignee history
2023Patents assigned to UNIV HOKKAIDO NAT UNIV CORP (1)· patent assignee history
2023Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD12023
UNIV HOKKAIDO NAT UNIV CORP12023
Locations
LocationPatentsSpan
JP12023