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Inventor

Walter Hub

Inventor
Munich, DE

Overview

2→
Patents
2000–2001
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
C01BNon-metallic elements20%
C01CAmmonia20%
C11DDetergent compositions20%
PatentTitleYear
6,271,188'Production of ready-to-use solutions'20016,066,609'Aqueous solution for cleaning a semiconductor substrate'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000Patents assigned to SIEMENS AG (1)· patent assignee history
2000–2001Based in Munich, DE· patent location history
2001Patents assigned to INFINEON TECHNOLOGIES AG (1)· patent assignee history
2001Patents assigned to MESSER GRIESHEIM GMBH (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INFINEON TECHNOLOGIES AG12001
MESSER GRIESHEIM GMBH12001
SIEMENS AG12000
Locations
LocationPatentsSpan
Munich, DE22000–2001