Inventor

KEITH MILLER P.E

Inventor
Mountain View, CA, US

Overview

72→
Patents
1979–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 72 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps25%
C23CCoating metallic material22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
H01LSemiconductor devices5%
G02BOptical elements, systems or apparatus4%
H02GInstallation of electric cables or lines, or of combined optical and electric cables or lines3%
Y10TTechnical subjects covered by former us classification3%
B61DBody details or kinds of railway vehicles2%
H01BCables2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
10,815,561Method and apparatus for asymmetric selective physical vapor deposition202010,727,092Heated substrate support ring202010,697,057Collimator for use in a physical vapor deposition chamber202010,336,347Railroad well car with open truss sides201910,312,065Physical vapor deposition (PVD) plasma energy control per dynamic magnetron control201910,283,331PVD plasma control using a magnet edge lift mechanism2019D0825504Target profile for a physical vapor deposition chamber target20189,984,911Electrostatic chuck design for high temperature RF applications20189,960,021Physical vapor deposition (PVD) target having low friction pads20189,957,601Apparatus for gas injection in a physical vapor deposition chamber20189,928,997'Apparatus for PVD dielectric deposition'20189,848,461Methods and apparatus for thermally treating a substrate2017D0797067'Target profile for a physical vapor deposition chamber target'20179,689,070'Deposition ring and electrostatic chuck for physical vapor deposition chamber'20179,605,341'Physical vapor deposition RF plasma shield deposit control'20179,580,795'Sputter source for use in a semiconductor process chamber'20179,564,348'Shutter blade and robot blade with CTE compensation'20179,534,286'PVD target for self-centering process shield'20179,476,122'Wafer processing deposition shielding components'20169,315,891'Methods for processing a substrate using multiple substrate support positions'20169,303,311'Substrate processing system with mechanically floating target assembly'20169,255,322'Substrate processing system having symmetric RF distribution and return paths'20169,249,500'PVD RF DC open/closed loop selectable magnetron'20169,177,763'Method and apparatus for measuring pressure in a physical vapor deposition chamber'20159,062,379'Wafer processing deposition shielding components'20158,920,613'Offset magnet compensation for non-uniform plasma'20148,911,601'Deposition ring and electrostatic chuck for physical vapor deposition chamber'20148,907,222'Adjustable cover for conductors and insulators'20148,901,429'Dimensionally adjustable cover for conductors and insulators'20148,901,428'Movably adjustable cover for conductors and insulators'20148,900,427'Homing device for magnetron rotating on two arms'20148,864,446'Wear pin gap closure detection system for gas turbine engine'20148,795,487'Physical vapor deposition chamber with rotating magnet assembly and centrally fed RF power'20148,764,949'Prediction and compensation of erosion in a magnetron sputtering target'20148,757,067'Railroad well car with open truss sides'20148,702,918'Apparatus for enabling concentricity of plasma dark space'20148,696,878'Wafer processing deposition shielding components'20148,685,215'Mechanism for continuously varying radial position of a magnetron'20148,580,094'Magnetron design for RF/DC physical vapor deposition'20138,573,932'Compressor blade root heating system'20138,559,159'Electrostatic chuck and methods of use thereof'20138,518,220'Method for predicting and compensating erosion in a magnetron sputtering target'20138,500,963'Sputtering of thermally resistive materials including metal chalcogenides'20138,435,379'Substrate cleaning chamber and cleaning and conditioning methods'20138,187,416'Interior antenna for substrate processing chamber'20128,133,360'Prediction and compensation of erosion in a magnetron sputtering target'2012D0646452'Tank frame'20118,021,527'Coaxial shafts for radial positioning of rotating magnetron'20117,955,270'Method and apparatus for respiratory audio-visual biofeedback for imaging and radiotherapy'20117,954,437'Railroad well car with open truss sides'2011D0637785'Tank frame'20117,846,310'Encapsulated and water cooled electromagnet array'20107,736,473'Magnetron having continuously variable radial position'20107,718,045'Ground shield with reentrant feature'20107,670,436'Support ring assembly'20107,569,125'Shields usable with an inductively coupled plasma reactor'20097,520,969'Notched deposition ring'20097,418,186'Fiber retention sleeve'20087,263,265'Convertible fiber closure platform'20077,239,789'Optical fiber splice case'20077,130,519'Convertible fiber closure platform'20067,041,200'Reducing particle generation during sputter deposition'20067,041,201'Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith'20067,038,137'Fiber closure system'20067,018,515'Selectable dual position magnetron'20066,856,747'Fiber optic cable closure and assembly'20056,143,140'Method and apparatus to improve the side wall and bottom coverage in IMP process by using magnetic field'20005,992,212'Device for determining coefficient of friction and level of lubrication'19995,949,551'Image handling method using different image resolutions'19994,457,329'Safety pressure regulator'19844,175,396'Cryogenic embrittlement freezer with gas lock'19794,155,702'Burner'1979

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1979–1984Based in Allentown, PA, US· patent location history
1999–2019Based in Schererville, IN, US· patent location history
2000–2020Patents assigned to APPLIED MATERIALS INC (50)· patent assignee history
2005–2014Patents assigned to PREFORMED LINE PRODUCTS CO (9)· patent assignee history
2005–2014Based in Twinsburg, OH, US· patent location history
2006–2014Based in Sunnyvale, CA, US· patent location history
2012–2016Patents assigned to MILLER KEITH A (18)· patent assignee history
2013–2016Patents assigned to RASHEED MUHAMMAD (5)· patent assignee history
2013–2020Based in Mountain View, CA, US· patent location history
2014–2016Patents assigned to RITCHIE ALAN (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC502000–2020
MILLER KEITH Aself182012–2016
PREFORMED LINE PRODUCTS CO92005–2014
RASHEED MUHAMMAD52013–2016
RITCHIE ALAN42014–2016
Locations
LocationPatentsSpan
Mountain View, California, US292013–2020
Sunnyvale, California, US202006–2014
Twinsburg, OH, US92005–2014
Schererville, IN, US61999–2019
Allentown, Pennsylvania, US31979–1984