Inventor
Oliver Kienzle
Inventor
Jena, DE
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps41%
B82YSpecific uses or applications of nanostructures26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
PatentTitleYear
10,504,681Particle-optical systems and arrangements and particle-optical components for such systems and arrangements20199,673,024'Particle-optical systems and arrangements and particle-optical components for such systems and arrangements'20179,224,576'Particle-optical systems and arrangements and particle-optical components for such systems and arrangements'20158,637,834'Particle-optical systems and arrangements and particle-optical components for such systems and arrangements'20148,268,516'Method for repairing phase shift masks'20128,264,535'Method and apparatus for analyzing a group of photolithographic masks'20128,097,847'Particle-optical systems and arrangements and particle-optical components for such systems and arrangements'20127,916,930'Method and arrangement for repairing photolithography masks'20117,554,094'Particle-optical systems and arrangements and particle-optical components for such systems and arrangements'20097,244,949'Particle-optical systems and arrangements and particle-optical components for such systems and arrangements'20077,135,677'Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system'20067,015,487'Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose'20066,967,328'Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor'20056,946,657'Electron microscopy system'20056,914,249'Particle-optical apparatus, electron microscopy system and electron lithography system'20056,903,337'Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same'20056,878,936'Applications operating with beams of charged particles'20056,756,599'Particle-optical apparatus, illumination apparatus and projection system as well as a method employing the same'20046,642,525'Particle-optical component and system comprising a particle-optical component'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2006Patents assigned to ZEISS CARL SMT AG (4)· patent assignee history
2003–2006Based in Aalen, DE· patent location history
2005–2006Patents assigned to ZEISS CARL NTS GMBH (5)· patent assignee history
2007–2019Based in Jena, DE· patent location history
2012–2014Patents assigned to KIENZLE OLIVER (4)· patent assignee history
2012Based in Jenna, DE· patent location history
2014–2019Patents assigned to APPLIED MATERIALS ISRAEL LTD (4)· patent assignee history
2014–2019Patents assigned to ZEISS CARL MICROSCOPY GMBH (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL NTS GMBH | 5 | 2005–2006 |
| APPLIED MATERIALS ISRAEL LTD | 4 | 2014–2019 |
| KIENZLE OLIVERself | 4 | 2012–2014 |
| ZEISS CARL MICROSCOPY GMBH | 4 | 2014–2019 |
| ZEISS CARL SMT AG | 4 | 2003–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Jena, DE | 9 | 2007–2019 |
| Aalen, DE | 9 | 2003–2006 |
| Jenna, DE | 1 | 2012 |