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Inventor

Ho Wei De

Inventor
Hsinchu, TW

Overview

2→
Patents
2014–2016
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10DInorganic electric semiconductor devices33%
H01LSemiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
9,236,267'Cut-mask patterning process for fin-like field effect transistor (FinFET) device'20168,741,776'Patterning process for fin-like field effect transistor (finFET) device'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2016Patents assigned to CHANG CHING-YU (2)· patent assignee history
2014–2016Patents assigned to DE HO WEI (2)· patent assignee history
2014–2016Patents assigned to SHIEH MING-FENG (2)· patent assignee history
2014–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (2)· patent assignee history
2014–2016Based in Hsinchu, TW· patent location history
2016Patents assigned to LU KUEI-LIANG (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHANG CHING-YU22014–2016
DE HO WEIself22014–2016
SHIEH MING-FENG22014–2016
TAIWAN SEMICONDUCTOR MFG22014–2016
LU KUEI-LIANG12016
Locations
LocationPatentsSpan
Hsinchu, TW22014–2016