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Inventor

Gerhard Ittner

Inventor
Oberkochen, DE

Overview

3→
Patents
1996–2001
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G02BOptical elements, systems or apparatus25%
PatentTitleYear
6,285,443'Illuminating arrangement for a projection microlithographic apparatus'20015,982,558'REMA objective for microlithographic projection exposure systems'19995,572,287'Illuminating arrangement for a projection microlithographic exposure apparatus'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2001Patents assigned to ZEISS STIFTUNG (3)· patent assignee history
1996–2001Based in Oberkochen, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS STIFTUNG31996–2001
Locations
LocationPatentsSpan
Oberkochen, DE31996–2001