Inventor
Armin Werber
Inventor
Gottenheim, DE
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
G02BOptical elements, systems or apparatus30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
F21VFunctional features or details of lighting devices or systems thereof7%
G01BMeasuring length, thickness or similar linear dimensions3%
G01SRadio direction-finding3%
H01FMagnets3%
PatentTitleYear
9,996,012Facet mirror for use in a projection exposure apparatus for microlithography20189,535,336'Microlithographic projection exposure apparatus'20179,523,922'Illumination system of a microlithographic projection exposure apparatus having a temperature control device'20169,513,562'Projection exposure apparatus for microlithography for the production of semiconductor components'20169,411,241'Facet mirror for use in a projection exposure apparatus for microlithography'20169,274,434'Light modulator and illumination system of a microlithographic projection exposure apparatus'20169,025,128'Actuator including magnet for a projection exposure system and projection exposure system including a magnet'20159,013,676'Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography'20158,885,143'Projection exposure apparatus for microlithography for the production of semiconductor components'20148,810,805'Light source for a sensor and a distance-measuring optoelectronic sensor'20148,797,507'Illumination system of a microlithographic projection exposure apparatus having a temperature control device'20148,767,176'Microlithographic projection exposure apparatus'20148,717,531'Mirror for guiding a radiation bundle'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2018Patents assigned to ZEISS CARL SMT GMBH (12)· patent assignee history
2014–2016Patents assigned to WERBER ARMIN (7)· patent assignee history
2014–2016Patents assigned to BACH FLORIAN (5)· patent assignee history
2014–2016Patents assigned to MUEHLBERGER NORBERT (4)· patent assignee history
2014Patents assigned to BENZ DANIEL (3)· patent assignee history
2014–2018Based in Gottenheim, DE· patent location history
2014Based in Waldkirch, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 12 | 2014–2018 |
| WERBER ARMINself | 7 | 2014–2016 |
| BACH FLORIAN | 5 | 2014–2016 |
| MUEHLBERGER NORBERT | 4 | 2014–2016 |
| BENZ DANIEL | 3 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Gottenheim, DE | 12 | 2014–2018 |
| Waldkirch, DE | 1 | 2014 |