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Inventor

Santiago del Puerto

Inventor
Milton, NY, US

Overview

2→
Patents
2001–2007
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
B82YSpecific uses or applications of nanostructures17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
7,209,220'System for using a two part cover for and a box for protecting a reticle'20076,239,863'Removable cover for protecting a reticle, system including and method of using the same'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to SILICON VALLEY GROUP (1)· patent assignee history
2001–2007Based in Milton, NY, US· patent location history
2007Patents assigned to ASML HOLDING NV (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML HOLDING NV12007
SILICON VALLEY GROUP12001
Locations
LocationPatentsSpan
Milton, New York, US22001–2007