Inventor
HIROYUKI WAKAYAMA
Inventor
JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds16%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
H01LSemiconductor devices13%
C08LCompositions of macromolecular compounds9%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
B05DProcesses for applying fluent materials to surfaces, in general3%
C08JWorking-up3%
C09JAdhesives3%
PatentTitleYear
12,510,823Resist underlayer film-forming composition containing alicyclic compound-terminated polymer202512,072,631Resist underlayer film-forming composition and method for forming resist pattern using the same202412,030,974Composition for forming block copolymer layer for formation of microphase-separated pattern202411,815,815Composition for forming silicon-containing resist underlayer film removable by wet process202311,674,053Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure202311,488,824Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development202211,440,985Underlayer film-forming composition for use in forming a microphase-separated pattern2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to NISSAN CHEMICAL CORP (4)· patent assignee history
2022–2023Patents assigned to NISSAN CHEMICAL IND LTD (3)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL CORP | 4 | 2022–2025 |
| NISSAN CHEMICAL IND LTD | 3 | 2022–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 7 | 2022–2025 |