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Inventor

Rouh Jier Wang

Inventor
Hsinchu, TW

Overview

4→
Patents
2016–2019
Patent span
Performing operations
Primary field (CPC B)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B08Bprimary
B08BCleaning in general25%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry13%
C01BNon-metallic elements13%
C23CCoating metallic material13%
F04DNon-positive-displacement pumps13%
F15DFluid dynamics, i.e. methods or means for influencing the flow of gases or liquids13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
PatentTitleYear
10,500,616In situ cleaning apparatus and system thereof20199,657,757'System of exhuast and operation method thereof'20179,643,217'In situ clean apparatus and method thereof'20179,278,860'Method and apparatus for recycling waste sulfuric acid'2016

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016–2019Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (4)· patent assignee history
2016–2019Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD42016–2019
Locations
LocationPatentsSpan
Hsinchu, TW42016–2019