Inventor
Takeo Hirabayashi
Inventor
Tokyo, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Cprimary
G03CPhotosensitive materials for photographic purposes60%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
Y10TTechnical subjects covered by former us classification20%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978–1983Patents assigned to RICOH KK (3)· patent assignee history
1978–1979Based in Tokyo, JP· patent location history
1983Based in Numazu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| RICOH KK | 3 | 1978–1983 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 2 | 1978–1979 |
| Numazu, JP | 1 | 1983 |