Inventor
Umesh M. Kelkar
Inventor
Santa Clara, CA, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps23%
C23CCoating metallic material19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
H01LSemiconductor devices15%
H10DInorganic electric semiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
B22FWorking metallic powder2%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
Y02PClimate change mitigation technologies in the production or processing of goods2%
PatentTitleYear
10,777,3913D printed chamber components configured for lower film stress and lower operating temperature202010,626,500Showerhead design202010,508,339Blocker plate for use in a substrate process chamber201910,221,483Showerhead design20199,863,038'Off-angled heating of the underside of a substrate using a lamp assembly'20189,818,587'Off-angled heating of the underside of a substrate using a lamp assembly'20179,520,267'Bias voltage frequency controlled angular ion distribution in plasma processing'20169,123,758'Gas injection apparatus and substrate process chamber incorporating same'20159,062,372'Self-ionized and capacitively-coupled plasma for sputtering and resputtering'20158,647,484'Target for sputtering chamber'20148,404,048'Off-angled heating of the underside of a substrate using a lamp assembly'20137,504,006'Self-ionized and capacitively-coupled plasma for sputtering and resputtering'20096,790,326'Magnetron for a vault shaped sputtering target having two opposed sidewall magnets'20046,406,599'Magnetron with a rotating center magnet for a vault shaped sputtering target'20026,350,320'Heater for processing chamber'20026,190,037'Non-intrusive, on-the-fly (OTF) temperature measurement and monitoring system'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2020Patents assigned to APPLIED MATERIALS INC (15)· patent assignee history
2001–2004Based in Sunnyvale, CA, US· patent location history
2009–2020Based in Santa Clara, CA, US· patent location history
2013–2016Patents assigned to KELKAR UMESH M (2)· patent assignee history
2013Patents assigned to BALASUBRAMANYAM CHANDRASEKHAR (1)· patent assignee history
2014–2015Patents assigned to KELKAR UMESH (2)· patent assignee history
2016Patents assigned to APPLIED MATEIRALS INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 15 | 2001–2020 |
| KELKAR UMESHself | 2 | 2014–2015 |
| KELKAR UMESH Mself | 2 | 2013–2016 |
| APPLIED MATEIRALS INC | 1 | 2016 |
| BALASUBRAMANYAM CHANDRASEKHAR | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Santa Clara, California, US | 12 | 2009–2020 |
| Sunnyvale, California, US | 4 | 2001–2004 |