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Inventor

Yenwen Lu

Inventor
Los Altos, CA, US

Overview

2→
Patents
2010–2012
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G06TImage data processing or generation, in general33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
8,291,352'Multivariable solver for optical proximity correction'20127,707,538'Multivariable solver for optical proximity correction'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010Patents assigned to BRION TECH INC (1)· patent assignee history
2010–2012Based in Los Altos, CA, US· patent location history
2012Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2012Patents assigned to CHEN BEEN-DER (1)· patent assignee history
2012Patents assigned to LI JIANGWEI (1)· patent assignee history
2012Patents assigned to LU YENWEN (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12012
BRION TECH INC12010
CHEN BEEN-DER12012
LI JIANGWEI12012
LU YENWENself12012
Locations
LocationPatentsSpan
Los Altos, California, US22010–2012