Inventor
MITSUNORI OHATA
Inventor
JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H01LSemiconductor devices21%
C23CCoating metallic material4%
H03HImpedance networks, e.g. resonant circuits4%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling2%
H01QAntennas, i.e. radio aerials2%
H02NElectric machines not otherwise provided for2%
PatentTitleYear
12,580,153Balanced resonator source for plasma processing202612,451,329Plasma processing apparatus with tunable electrical characteristic202512,394,600Balanced RF resonant antenna system202512,394,629Plasma processing methods using low frequency bias pulses202512,374,531Plasma processing apparatus202512,347,646Plasma processing apparatus202512,347,654Plasma processing apparatus202512,334,313Plasma processing apparatus and plasma processing method202512,300,468Method of uniformity control202512,230,475Systems and methods of control for plasma processing202512,183,583Remote source pulsing with advanced pulse control202412,154,761Plasma processing apparatus and plasma processing method202411,972,925Plasma processing apparatus and plasma processing method202411,915,910Fast neutral generation for plasma processing202411,817,295Three-phase pulsing systems and methods for plasma processing202311,798,787Plasma processing apparatus and plasma processing method202311,521,834Plasma processing systems and methods for chemical processing a substrate202211,450,515Plasma processing apparatus202211,251,021Mode-switching plasma systems and methods of operating thereof202211,158,516Plasma processing methods using low frequency bias pulses2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TOKYO ELECTRON LTD (20)· patent assignee history
2021–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 20 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 20 | 2021–2026 |