Inventor
Werner Frass
Inventor
Wiesbaden, DE
Overview
Patents· 31 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
B41NPrinting plates or foils12%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
G03CPhotosensitive materials for photographic purposes5%
G03GElectrography5%
C08LCompositions of macromolecular compounds3%
C25FProcesses for the electrolytic removal of materials from objects3%
C07DHeterocyclic compounds2%
C23CCoating metallic material2%
PatentTitleYear
5,967,047'Thermal process for applying hydrophilic layers to hydrophobic substrates for offset printing plates'19995,922,508'Photopolymerizable recording material'19995,900,352'Developer for irradiated radiation-sensitive recording materials'19995,753,404'Photosensitive recording material containing negative working diazonium salt layer and discontinuous top layer'19985,744,272'Electrophotographic recording material for the production of printing plates'19985,705,313'Process for the production of a lithographic printing plate through selective transfer'19985,695,903'Process for developing irradiated radiation-sensitive recording materials'19975,576,137'Matted, radiation-sensitive recording material and printing plate'19965,302,487'Negative-working photosensitive coating solution containing photohardenable diazo compound, polymeric binder and four component solvent'19945,116,720'Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms'19925,114,832'Photopolymerizable mixture and recording material prepared therefrom, having a photoinitiating set of compounds which give increased absorption below 450 nm'19925,085,974'Photopolymerizable mixture, and a recording material produced therefrom'19925,077,177'Process for the production of relief forms with a developing solvent comprising phenol ether'19915,068,163'Radiation-sensitive positive working composition and copying material'19915,043,249'Photopolymerizable composition comprising (meth)acrylates with photooxidizable groups and a recording material produced therefrom'19914,987,055'Photopolymerizable composition comprising (meth)acrylates with photooxidizable groups, and a recording material produced therefrom'19914,985,341'Photopolymerizable mixture, and a recording material produced therefrom'19914,983,498'Photopolymerizable mixture and recording material produced therefrom'19914,929,534'Positive-working photosensitive mixture and photolithographic copying material produced therefrom with o-quinone dialide sulfonyl ester and azo coupler'19904,834,844'Process for the selective additive correction of voids in copying layers'19894,725,526'Process for reducing halations using lubricant in the course of irradiating and developing reproduction layers used for preparing printing plates'19884,716,098'Developer for preparing printing forms and process therefor'19874,618,405'Process for the electrochemical roughening of aluminum for use as printing plate supports, in an aqueous mixed electrolyte'19864,579,811'Process for developing exposed diazo negative-working reproduction layers using aqueous developer having salt of aromatic carboxylic acid with adjacent group substituent'19864,530,897'Process for desensitizing diazo lithographic printing forms using desensitizing solution with light absorbing compound'19854,482,444'Process for electrochemically modifying electrochemically roughened aluminum support materials and the use of these materials in the manufacture of offset printing plates'19844,458,005'Polyvinylmethylphosphinic acid, process for its manufacture and use'19844,447,510'Process for producing relief copies in light hardenable materials with ultrasonic treatment'19844,427,765'Hydrophilic coating of salt-type phosphorus or sulfur polymer on aluminum support materials for offset printing plates and process for manufacture and use with light sensitive layer thereon'19844,387,151'Light-curable mixture and light-sensitive copying material made therewith'19834,101,327'Light-sensitive copying compositions and photoinitiators contained therein'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978–1994Patents assigned to HOECHST AG (23)· patent assignee history
1978–1999Based in Wiesbaden-Naurod, DE· patent location history
1983–1999Based in Wiesbaden, DE· patent location history
1996–1999Patents assigned to AGFA GEVAERT AG (8)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOECHST AG | 23 | 1978–1994 |
| AGFA GEVAERT AG | 8 | 1996–1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Wiesbaden, DE | 24 | 1983–1999 |
| Wiesbaden-Naurod, DE | 7 | 1978–1999 |