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Inventor

JOHANNES MARCUS MARIA BELTMAN

Inventor
NL

Overview

3→
Patents
2021–2025
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions50%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
PatentTitleYear
12,429,328Metrology method, target and substrate202511,428,521Metrology method, target and substrate202211,204,239Metrology method, target and substrate2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2025Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2021–2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32021–2025
Locations
LocationPatentsSpan
NL32021–2025