Inventor

Katsuyuki Watanabe

Inventor

Minami-ashigara, JP

Overview

1979–2020

Patent span

Chemistry

Primary field (CPC C)

Patents· 46 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Cprimary

G03CPhotosensitive materials for photographic purposes16%

C07CAcyclic or carbocyclic compounds12%

C07DHeterocyclic compounds8%

Y02PClimate change mitigation technologies in the production or processing of goods6%

C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium4%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

A61KPreparations for medical, dental or toiletry purposes3%

A61PSpecific therapeutic activity of chemical compounds or medicinal preparations3%

C07BGeneral methods of organic chemistry3%

PatentTitleYear

10,570,112Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-b-D-arabinofuranosyl)cytosine, synthetic intermediate of thionucleoside, and method for producing the same2020 10,428,042Compound useful for manufacturing salacinol, method for manufacturing the compound, method for manufacturing salacinol, methods for protecting and deprotecting diol group, and protective agent for diol group2019 10,093,645Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-b-D-arabinofuranosyl)cytosine, synthetic intermediate of thionucleoside, and method for producing the same2018 10,059,686Compound useful for manufacturing salacinol, method for manufacturing the compound, method for manufacturing salacinol, methods for protecting and deprotecting diol group, and protective agent for diol group2018 9,802,913'Compound useful for manufacturing salacinol, method for manufacturing the compound, method for manufacturing salacinol, methods for protecting and deprotecting diol group, and protective agent for diol group'2017 9,475,835'Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-Î²-D-arabinofuranosyl) cytosine, synthetic intermediate of thionucleoside, and method for producing the same'2016 9,221,865'Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-Î²-D-arabinofuranosyl)cytosine, synthetic intermediate of thionucleoside, and method for producing the same'2015 9,187,514'Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-Î²-D-arabinofuranosyl)cytosine, synthetic intermediate of thionucleoside, and method for producing the same'2015 9,181,203'Substituted pyrazino[2,3-d]isooxazoles as intermediates for the synthesis of substituted pyrazinecarbonitriles and substituted pyrazinecarboxamides'2015 8,901,302'Pyrazino[2,3-D]isoxazole derivative which is useful as a production intermediate of pyrazine carboxamide derivative'2014 8,530,583'Thermo- and/or photo-sensitive material and insulator film made thereof'2013 7,872,164'Process for producing 4,9-dibromodiamantane'2011 7,799,949'Tetraphenylmethane skeleton-containing compound'2010 7,750,102'Insulating film for semiconductor integrated circuit'2010 7,612,155'Film forming composition, insulating film formed by use of the composition, and electronic device'2009 7,534,292'Film-forming composition, insulating film obtained from the composition and electronic device having the same'2009 7,501,185'Film-forming composition, insulating material-forming composition, insulating film and electronic device'2009 7,497,965'Insulating film-forming composition, insulating film and production method thereof'2009 7,309,752'Polymer and film forming composition'2007 7,150,963'Silver halide emulsion, silver halide photosensitive material, and photothermographic material'2006 7,147,999'Photothermographic material'2006 7,125,657'Photothermographic material'2006 7,074,354'Process for producing colored shaped article from curable resin, colored shaped article produced from curable resin, and shaping apparatus'2006 7,026,109'Photothermographic material'2006 6,818,374'Silver halide photographic light-sensitive materials and method for development of the same'2004 6,746,835'Thermally processed image recording material'2004 6,566,042'Method for producing image and high-speed photothermographic material'2003 6,482,582'Image recording material'2002 6,383,731'Polyhalogenomethylsulfonyl compound'2002 6,376,166'Heat-developable photosensitive material'2002 6,368,782'Photothermographic material'2002 6,358,677'Heat-developable recording material'2002 6,350,569'Heat-developable photographic material'2002 6,329,127'Heat-developable photosensitive material and method for forming image using the same'2001 6,329,134'Heat-developable photosensitive material'2001 6,316,670'Polyhalogenomethylsulfonyl compound'2001 6,274,302'Photothermographic element'2001 6,261,739'Laser ablative recording material'2001 6,027,872'Thermographic photographic element'2000 6,025,122'Heat-developable photographic materials'2000 5,951,754'Method of fabricating semiconductor quantum box'1999 5,100,759'Color light-sensitive material with infrared dye releaser'1992 4,851,353'Method and test composition for determination of lipid peroxide'1989 4,384,042'Method and test composition for determination of hydrogen peroxide'1983 4,271,310'Method of determining cholinesterase activity and choline derivatives for use in the method'1981 4,141,792'Composition and method for the quantitative determination of phospholipids'1979

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1979–2013Patents assigned to WATANABE KATSUYUKI (2)· patent assignee history

1981–1989Patents assigned to KYOWA HAKKO KOGYO KK (3)· patent assignee history

1992–2006Patents assigned to FUJI PHOTO FILM CO LTD (20)· patent assignee history

1992–2006Based in Kanagawa, JP· patent location history

2001–2004Based in Minami-ashigara, JP· patent location history

2006–2020Patents assigned to FUJIFILM CORP (19)· patent assignee history

2007–2013Based in Shizuoka, JP· patent location history

2010–2011Based in Haibara-gun, JP· patent location history

2014–2015Patents assigned to TOYAMA CHEMICAL CO LTD (2)· patent assignee history

2014–2020Based in Ashigarakami-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
FUJI PHOTO FILM CO LTD	20	1992–2006
FUJIFILM CORP	19	2006–2020
KYOWA HAKKO KOGYO KK	3	1981–1989
TOYAMA CHEMICAL CO LTD	2	2014–2015
WATANABE KATSUYUKIself	2	1979–2013

Locations

Location	Patents	Span
Minami-ashigara, JP	12	2001–2004
Ashigarakami-gun, JP	10	2014–2020
Kanagawa, JP	9	1992–2006
Shizuoka, JP	7	2007–2013
Haibara-gun, JP	2	2010–2011