Inventor
HILKO DIRK BOS
Inventor
NL
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G01NInvestigating or analysing materials by determining their chemical or physical properties25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G01BMeasuring length, thickness or similar linear dimensions13%
PatentTitleYear
12,276,921Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method202512,105,432Metrology method and associated computer product202411,181,828Method of determining a value of a parameter of interest of a patterning process, device manufacturing method2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2021–2025Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 3 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 3 | 2021–2025 |