Inventor

Cecilia W. Kiarie

Inventor

Shrewsbury, MA, US

Overview

2015–2020

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds15%

C09DCoating compositions, e.g. paints, varnishes or lacquers10%

H01LSemiconductor devices10%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%

B05DProcesses for applying fluent materials to surfaces, in general5%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%

C08JWorking-up5%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%

C08LCompositions of macromolecular compounds5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2015–2020Patents assigned to ROHM & HAAS ELECT MAT (4)· patent assignee history

2015–2016Patents assigned to AUGER ROBERT L (2)· patent assignee history

2015–2016Patents assigned to DOW GLOBAL TECHNOLOGIES LLC (2)· patent assignee history

2015–2016Patents assigned to KIARIE CECILIA W (2)· patent assignee history

2015–2016Patents assigned to RAO YUANQIAO (2)· patent assignee history

2015–2016Based in Marlborough, MA, US· patent location history

2019–2020Based in Shrewsbury, MA, US· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Shrewsbury, Massachusetts, US	2	2019–2020
Marlborough, Massachusetts, US	2	2015–2016