Inventor
Youhei Ohno
Inventor
Saitama, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices30%
H10DInorganic electric semiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G03GElectrography10%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
PatentTitleYear
10,297,557Semiconductor device and method for manufacturing the semiconductor device201910,158,013Semiconductor device and method for manufacturing the semiconductor device20189,991,379Semiconductor device with a gate insulating film formed on an inner wall of a trench, and method of manufacturing the same20188,841,051'Full color image forming method using two cyan toners'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014Patents assigned to HIRANO SHIRO (1)· patent assignee history
2014Patents assigned to HIROSE NAOHIRO (1)· patent assignee history
2014Patents assigned to KONICA MINOLTA BUSINESS TECH (1)· patent assignee history
2014Patents assigned to MURAKAMI MIYUKI (1)· patent assignee history
2014Based in Tokyo, JP· patent location history
2018–2019Patents assigned to SANKEN ELECTRIC CO LTD (3)· patent assignee history
2018–2019Based in Saitama, JP· patent location history
2018Based in Niiza, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SANKEN ELECTRIC CO LTD | 3 | 2018–2019 |
| HIRANO SHIRO | 1 | 2014 |
| HIROSE NAOHIRO | 1 | 2014 |
| KONICA MINOLTA BUSINESS TECH | 1 | 2014 |
| MURAKAMI MIYUKI | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Saitama, JP | 2 | 2018–2019 |
| Niiza, JP | 1 | 2018 |
| Tokyo, JP | 1 | 2014 |