Inventor

Reinhard Schauer

Inventor

Laufen, DE

Overview

1994–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%

C30BSingle-crystal growth30%

C23CCoating metallic material11%

H01LSemiconductor devices9%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%

B82YSpecific uses or applications of nanostructures2%

H10DInorganic electric semiconductor devices2%

Y10TTechnical subjects covered by former us classification2%

PatentTitleYear

10,991,614Susceptor for holding a semiconductor wafer with an orientation notch during the deposition of a layer on a front side of the semiconductor wafer and method for depositing the layer by using the susceptor2021 10,597,795Method for producing a semiconductor wafer with epitaxial layer in a deposition chamber, apparatus for producing a semiconductor wafer with epitaxial layer, and semiconductor wafer with epitaxial layer2020 9,991,208Susceptor for holding a semiconductor wafer having an orientation notch, a method for depositing a layer on a semiconductor wafer, and semiconductor wafer2018 9,240,316'Method for producing an epitaxially coated semiconductor wafer'2016 8,304,860'Epitaxially coated silicon wafer and method for producing an epitaxially coated silicon wafer'2012 7,935,614'Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafers'2011 7,922,813'Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafers'2011 7,838,398'Epitaxially coated semiconductor wafer and device and method for producing an epitaxially coated semiconductor wafer'2010 7,659,207'Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafer'2010 7,579,261'Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafers'2009 7,285,483'Coated semiconductor wafer, and process and apparatus for producing the semiconductor wafer'2007 7,101,794'Coated semiconductor wafer, and process and device for producing the semiconductor wafer'2006 6,630,024'Method for the production of an epitaxially grown semiconductor wafer'2003 6,306,735'Method for producing a semiconductor wafer'2001 5,355,831'Epitaxially coated semiconductor wafers having low-oxygen zone of adjustable extent and process for producing same'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2021Based in Laufen, DE· patent location history

2001–2003Patents assigned to WACKER SILTRONIC HALBLEITERMAT (2)· patent assignee history

2006–2021Patents assigned to SILTRONIC AG (11)· patent assignee history

2012–2016Patents assigned to SCHAUER REINHARD (2)· patent assignee history

2012Patents assigned to LAUBE FRANK (1)· patent assignee history

2016Patents assigned to HAGER CHRISTIAN (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SILTRONIC AG	11	2006–2021
SCHAUER REINHARDself	2	2012–2016
WACKER SILTRONIC HALBLEITERMAT	2	2001–2003
HAGER CHRISTIAN	1	2016
LAUBE FRANK	1	2012

Locations

Location	Patents	Span
Laufen, DE	15	1994–2021