Inventor
Mingming Fang
Inventor
Naperville, IL, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Gprimary
C09GPolishing compositions22%
C09KMaterials for miscellaneous applications, not provided for elsewhere20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
G11BInformation storage based on relative movement between record carrier and transducer14%
B24BMachines, devices, or processes for grinding or polishing6%
B01DSeparation4%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%
F23JRemoval or treatment of combustion products or combustion residues4%
A61KPreparations for medical, dental or toiletry purposes2%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations2%
PatentTitleYear
10,857,186Traditional Chinese medicine composition for treating acute stage of cerebral infarction20208,992,868'Dry processes, apparatus compositions and systems for reducing mercury, sulfur oxides and HCl'20158,916,120'Dry processes, apparatus, compositions and systems for reducing sulfur oxides and HCI'20147,267,784'Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfaces'20077,223,156'Method chemical-mechanical polishing and planarizing corundum, GaAs, GaP and GaAs/GaP alloy surfaces'20077,112,123'Chemical-mechanical polishing (CMP) slurry containing clay and CeO2 abrasive particles and method of planarizing surfaces'20067,087,529'Chemical-mechanical polishing (CMP) slurry and method of planarizing surfaces'20066,976,905'Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system'20056,805,812'Phosphono compound-containing polishing composition and method of using same'20046,793,559'Composition and method for polishing rigid disks'20046,716,755'Composition and method for planarizing surfaces'20046,527,817'Composition and method for planarizing surfaces'20036,471,884'Method for polishing a memory or rigid disk with an amino acid-containing composition'20026,468,137'Method for polishing a memory or rigid disk with an oxidized halide-containing polishing system'20026,461,227'Method of polishing a memory or rigid disk with an ammonia-and/or halide-containing composition'20026,347,978'Composition and method for polishing rigid disks'20026,293,848'Composition and method for planarizing surfaces'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2005Patents assigned to CABOT MICROELECTRONICS CORP (10)· patent assignee history
2001–2015Based in Naperville, IL, US· patent location history
2006–2007Patents assigned to AMCOL INTERNATIONAL CORP (4)· patent assignee history
2014–2015Patents assigned to FUEL TECH INC (2)· patent assignee history
2020Patents assigned to JIANGSU PROVINCE INST OF TRADITIONAL CHINESE MEDICINE (1)· patent assignee history
2020Based in Nanjing, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CABOT MICROELECTRONICS CORP | 10 | 2001–2005 |
| AMCOL INTERNATIONAL CORP | 4 | 2006–2007 |
| FUEL TECH INC | 2 | 2014–2015 |
| JIANGSU PROVINCE INST OF TRADITIONAL CHINESE MEDICINE | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Naperville, Illinois, US | 16 | 2001–2015 |
| Nanjing, CN | 1 | 2020 |