Inventor

Masayuki Naya

Inventor

Kanagawa, JP

Overview

1993–2020

Patent span

Physics

Primary field (CPC G)

Patents· 81 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary

G01NInvestigating or analysing materials by determining their chemical or physical properties35%

B82YSpecific uses or applications of nanostructures7%

G02BOptical elements, systems or apparatus5%

E04BGeneral building constructions4%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%

G10KSound-producing devices4%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%

H01JElectric discharge tubes or discharge lamps3%

H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%

PatentTitleYear

10,864,765Autograph support device2020 10,866,348Heat ray-shielding material and architectural member, cage member, and side surface wall using the same2020 10,852,767Handwriting support device2020 10,854,183Soundproof structure2020 10,704,255Soundproof structure and soundproof structure manufacturing method2020 10,676,919Soundproof structure, louver, and partition2020 10,562,337Autograph support device2020 10,431,196Soundproof structure and adjustment method of soundproof structure2019 10,295,809Optical element, extended optical element comprising optical element, and lamp housing2019 10,099,317Soundproof structure and soundproof structure manufacturing method2018 9,887,388'Electroluminiscent element having a high effient light output'2018 9,791,375'Light measuring apparatus employing optical electric field enhancing device'2017 9,738,559'Heat ray-shielding material'2017 9,728,388'Measurement device, measurement apparatus, and method'2017 9,645,087'Measuring apparatus where a distance between a surface of a transparent substrate on which a marker pattern is formed and a front surface is within a depth of focus of a detecting means'2017 9,575,003'Optical field enhancement device, light measurement apparatus and method'2017 9,304,086'Raman spectrometry method and Raman spectrometry apparatus'2016 9,257,661'Light emitting device'2016 9,140,652'Light measurement method and measurement apparatus using an optical field enhancement device'2015 9,059,568'Optical electrical field enhancing device and measuring apparatus equipped with the device'2015 8,803,105'Optical field enhancement device'2014 8,638,031'Organic electroluminescence device'2014 8,273,982'Photoelectric converting device'2012 8,268,613'Surface plasmon resonance measuring chip and method of manufacture thereof'2012 8,213,004'Method and apparatus for measuring raman signals'2012 8,044,344'Mass spectroscope'2011 8,023,115'Sensor, sensing system and sensing method'2011 7,999,934'Spectroscopic device and raman spectroscopic system'2011 7,952,707'Microstructures, method for producing microstructures, and optical field amplifying device'2011 7,898,659'Surface plasmon sensor, sensing apparatus and sensing method'2011 7,843,571'Sensing system'2010 7,812,957'Light measurement apparatus measuring two-dimensional physical properties of a sample'2010 7,732,745'Imaging apparatus including a solid state imaging device including a plurality of photo diodes'2010 7,728,289'Mass spectroscopy device and mass spectroscopy system'2010 7,643,156'Sensor, multichannel sensor, sensing apparatus, and sensing method'2010 7,579,588'Base plate for use in mass spectrometry analysis, and method and apparatus for mass spectrometry analysis'2009 7,551,286'Measurement apparatus'2009 7,544,922'Near-field light-emitting element and optical head'2009 7,518,800'Solid state imaging device'2009 7,501,649'Sensor including porous body with metal particles loaded in the pores of the body and measuring apparatus using the same'2009 7,307,731'Method of detecting test bodies'2007 7,288,419'Microstructure for use in Raman spectrometry and production process for the microstructure'2007 7,224,451'Raman spectroscopy method, raman spectroscopy system and raman spectroscopy device'2007 7,187,444'Measuring method and apparatus using attenuation in total internal reflection'2007 7,177,072'Optical wavelength converting device and process for producing the same'2007 7,064,837'Measuring sensor utilizing attenuated total reflection and measuring chip assembly'2006 7,057,731'Measuring method and apparatus using attenuated total reflection'2006 7,058,001'Recording medium and information recording and reproducing method using the same'2006 7,027,159'Sensor utilizing evanescent wave'2006 6,998,223'Optical wavelength converting device and process for producing the same'2006 6,992,770'Sensor utilizing attenuated total reflection'2006 6,947,145'Measuring apparatus'2005 6,885,454'Measuring apparatus'2005 6,864,984'Measuring method and apparatus using attenuation in total reflection'2005 6,829,052'Sensor detecting attenuated total reflection angle by using semiconductor laser unit driven with driving current on which high frequency component is superimposed'2004 6,741,352'Sensor utilizing attenuated total reflection'2004 6,707,538'Near-field exposure system selectively applying linearly polarized exposure light to exposure mask'2004 6,611,367'Surface plasmon optical modulator element'2003 6,597,456'Measuring chip for quantitative analysis of substances'2003 6,584,062'Near-field optical recording apparatus assistively heating recording medium'2003 6,577,396'Surface plasmon sensor'2003 6,497,996'Fine pattern forming method'2002 6,437,887'Optical logic device and optical memory device'2002 6,426,491'Micro-aperture probe evaluating apparatus having a display and a collimating optical system'2002 6,417,925'Surface plasmon sensor for analyzing liquid sample or humid atmosphere'2002 6,344,367'Method of fabricating a diffraction grating'2002 6,340,448'Surface plasmon sensor'2002 6,338,924'Photomask for near-field exposure having opening filled with transparent material'2002 6,232,588'Near field scanning apparatus having an intensity distribution pattern detection'2001 6,208,422'Surface plasmon sensor'2001 6,043,485'Sample analyzer'2000 5,926,284'Surface plasmon sensor'1999 5,923,031'Surface plasmon sensor having a coupler with a refractive index matching liquid'1999 5,917,607'Surface plasmon sensor for multiple channel analysis'1999 5,917,608'Surface plasmon sensor'1999 5,907,408'Surface plasmon sensor'1999 5,875,032'Surface plasmon sensor having an improved optical system'1999 5,856,873'Ellipso sensor using a prism'1999 5,278,869'Optical wavelength converting apparatus'1994 5,265,110'Non-linear optical effect frequency conversion laser'1993 5,231,643'Optical frequency converter of bulk resonator structure'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2009Patents assigned to FUJI PHOTO FILM CO LTD (39)· patent assignee history

1993–1994Based in Shizuoka, JP· patent location history

1999–2020Based in Kanagawa, JP· patent location history

2002–2012Based in Kaisei-machi, JP· patent location history

2007–2020Patents assigned to FUJIFILM CORP (39)· patent assignee history

2009–2020Based in Ashigarakami-gun, JP· patent location history

2012–2018Patents assigned to NAYA MASAYUKI (7)· patent assignee history

2012Patents assigned to TOMARU YUICHI (2)· patent assignee history

2014–2018Patents assigned to UDC IRELAND LTD (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
FUJI PHOTO FILM CO LTD	39	1993–2009
FUJIFILM CORP	39	2007–2020
NAYA MASAYUKIself	7	2012–2018
TOMARU YUICHI	2	2012
UDC IRELAND LTD	2	2014–2018

Locations

Location	Patents	Span
Kanagawa, JP	28	1999–2020
Ashigarakami-gun, JP	26	2009–2020
Kaisei-machi, JP	24	2002–2012
Shizuoka, JP	3	1993–1994