Inventor
WOO JUNG SHIN
Inventor
US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
B08BCleaning in general7%
B82YSpecific uses or applications of nanostructures7%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
C09KMaterials for miscellaneous applications, not provided for elsewhere7%
C23CCoating metallic material7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
PatentTitleYear
12,598,928Apparatus and methods for selectively etching silicon oxide films202612,112,938Semiconductor processing preclean methods and apparatus202411,762,289Composition including quantum dot, manufacturing method quantum dot and color filter202311,437,241Apparatus and methods for selectively etching silicon oxide films2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to ASM IP HOLDING BV (2)· patent assignee history
2022–2026Based in US· patent location history
2023Patents assigned to SAMSUNG SDI CO LTD (1)· patent assignee history
2023Based in KR· patent location history
2026Patents assigned to ASM IP HOLDING B V (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM IP HOLDING BV | 2 | 2022–2024 |
| ASM IP HOLDING B V | 1 | 2026 |
| SAMSUNG SDI CO LTD | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 3 | 2022–2026 |
| KR | 1 | 2023 |