Inventor
Johannes Bihr
Inventor
Aalen, DE
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps73%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
B82YSpecific uses or applications of nanostructures9%
PatentTitleYear
8,058,614'Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof'20117,645,989'Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof'20107,521,693'Ion sources, systems and methods'20097,285,780'Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system'20077,060,978'Detector system for a particle beam apparatus, and particle beam apparatus with such a detector system'20066,239,430'Particle beam apparatus with energy filter'20015,177,361'Electron energy filter'19935,134,339'High-voltage lead-through for particle-beam apparatus'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–1993Patents assigned to ZEISS STIFTUNG (2)· patent assignee history
1992–2011Based in Aalen, DE· patent location history
2006–2011Patents assigned to ZEISS CARL NTS GMBH (4)· patent assignee history
2009Patents assigned to ALIS CORP (1)· patent assignee history
2011Patents assigned to BIHR JOHANNES (1)· patent assignee history
2011Patents assigned to BUDACH MICHAEL (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL NTS GMBH | 4 | 2006–2011 |
| ZEISS STIFTUNG | 2 | 1992–1993 |
| ALIS CORP | 1 | 2009 |
| BIHR JOHANNESself | 1 | 2011 |
| BUDACH MICHAEL | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 8 | 1992–2011 |