Inventor
H. Daniel Dulman
Inventor
Boise, ID, US
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
7,350,182'Methods of forming patterned reticles'20087,291,425'Radiation patterning tools, and methods of forming radiation patterning tools'20077,226,707'Methods of printing structures'20077,107,572'Methods of forming patterned reticles'20067,093,227'Methods of forming patterned reticles'20067,086,031'Methods of forming patterned reticles'20067,073,161'Methods of forming patterned reticles'20067,008,738'Microlithographic structures and method of fabrication'20066,911,301'Methods of forming aligned structures with radiation-sensitive material'20056,887,629'Radiation-patterning tool'20056,842,889'Methods of forming patterned reticles'20056,841,310'Radiation patterning tools, and methods of forming radiation patterning tools'20056,803,155'Microlithographic device, microlithographic assist features, system for forming contacts and other structures, and method of determining mask patterns'20046,737,200'Method for aligning a contact or a line to adjacent phase-shifter on a mask'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2008Patents assigned to MICRON TECHNOLOGY INC (14)· patent assignee history
2004–2008Based in Boise, ID, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 14 | 2004–2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 14 | 2004–2008 |