Inventor
Julian Kaller
Inventor
Koenigsbronn, DE
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G02BOptical elements, systems or apparatus35%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
Y10TTechnical subjects covered by former us classification5%
B29DProducing particular articles from plastics or from substances in a plastic state3%
C03BManufacture, shaping, or supplementary processes3%
C03CChemical composition of glasses, glazes or vitreous enamels3%
G01MTesting static or dynamic balance of machines or structures3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
PatentTitleYear
10,509,336Optical assembly having a thermally conductive component201910,281,824Microlithography projection objective201910,203,607Optical element unit for exposure processes20199,703,098'Lens module comprising at least one exchangeable optical element'20179,423,695'Lens module comprising at least one exchangeable optical element'20169,097,984'Microlithography projection objective'20159,046,795'Optical element unit for exposure processes having sealing element'20158,939,587'Lens module comprising at least one exchangeable optical element'20158,870,396'Substrates for mirrors for EUV lithography and their production'20148,376,559'Lens module comprising at least one exchangeable optical element'20138,248,578'Projection exposure method and projection exposure system therefor'20128,092,029'Lens module comprising at least one exchangeable optical element'20127,659,976'Devices and methods for inspecting optical elements with a view to contamination'20107,545,483'Optical element unit for exposure processes'20097,443,500'Apparatus for scattered light inspection of optical elements'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2010Patents assigned to ZEISS CARL SMT AG (3)· patent assignee history
2008–2019Based in Koenigsbronn, DE· patent location history
2012–2019Patents assigned to ZEISS CARL SMT GMBH (12)· patent assignee history
2012–2015Patents assigned to KALLER JULIAN (4)· patent assignee history
2012–2015Patents assigned to LIMBACH GUIDO (3)· patent assignee history
2012–2013Patents assigned to BACK STEPHAN (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 12 | 2012–2019 |
| KALLER JULIANself | 4 | 2012–2015 |
| LIMBACH GUIDO | 3 | 2012–2015 |
| ZEISS CARL SMT AG | 3 | 2008–2010 |
| BACK STEPHAN | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koenigsbronn, DE | 15 | 2008–2019 |